Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16855784 | 0.81 | HTT (0.37) | HTTMEN1KMT2AL3MBTL1TSHR | |
| SCHEMBL19835388 | 0.77 | MEN1 (0.39) | EPHX2HTTMEN1KMT2AL3MBTL1 | |
| SCHEMBL26764011 | 0.76 | MEN1 (0.46) | HTTMEN1KMT2AL3MBTL1TSHR | |
| SCHEMBL30367643 | 0.74 | MEN1 (0.34) | EPHX2HTTMEN1KMT2ATSHR | |
| SCHEMBL23423124 | 0.74 | LIPC (0.32) | EPHX2 | |
| SCHEMBL17493142 | 0.74 | MEN1 (0.34) | EPHX2HTTMEN1KMT2ATSHR | |
| SCHEMBL27888454 | 0.73 | EPHX2 (0.46) | EPHX2HTTMEN1KMT2ATSHR | |
| SCHEMBL29365844 | 0.73 | MEN1 (0.33) | HTTMEN1KMT2ATSHR | |
| SCHEMBL17874179 | 0.73 | EPHX2 (0.36) | EPHX2 | |
| SCHEMBL7526154 | 0.72 | LMNA (0.42) | CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4258056-A2 | ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-20220197140-A1 | ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-23 | — | — | US | disclosed |