SCHEMBL246239

SCHEMBL246239

C=CC(=O)OCCCOc1ccc(C(C)(C)c2ccc(OCCCOC(=O)C=C)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.55
ALDH1A1 P00352 9/20 0.52
GAA P10253 1/20 0.52
TSHR P16473 2/20 0.51
HPGD P15428 1/20 0.51
KDM4E B2RXH2 9/20 0.50
SMN1; SMN2 Q16637 4/20 0.50
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
HTT P42858 2/20 0.49
CYP3A4 P08684 1/20 0.47
POLB P06746 3/20 0.47
LMNA P02545 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
MAPT P10636 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11132915 0.97 THRB (0.55) THRBALDH1A1GAATSHRHPGD
SCHEMBL7625535 0.96 THRB (0.51) THRBALDH1A1GAATSHRHPGD
SCHEMBL21154699 0.96 TSHR (0.59) THRBALDH1A1GAATSHRHPGD
SCHEMBL7630968 0.96 THRB (0.51) THRBALDH1A1GAATSHRHPGD
SCHEMBL825028 0.95 THRB (0.50) THRBALDH1A1GAATSHRHPGD
SCHEMBL5899547 0.95 THRB (0.61) THRBALDH1A1GAATSHRHPGD
SCHEMBL14173110 0.93 THRB (0.65) THRBALDH1A1GAATSHRHPGD
SCHEMBL137572 0.93 THRB (0.65) THRBALDH1A1GAATSHRHPGD
SCHEMBL28483790 0.92 THRB (0.61) THRBALDH1A1GAATSHRHPGD
SCHEMBL11035951 0.91 POLB (0.53) THRBALDH1A1GAATSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110452657-B Solvent-free polyurethane composite adhesive 温州大学新材料与产业技术研究院 2021-10-26 CN claimed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US claimed
EP-0035574-B1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1985-02-06 EP claimed
EP-0012948-B1 SCRATCH-RESISTANT, DYEABLE COATING COMPOSITIONS FOR SYNTHETIC RESIN ARTICLES MITSUBISHI RAYON CO., LTD. (JP) 1983-02-02 EP claimed
US-4370403-A BENZIL AND /DIMETHYLAMINO/BENZALDEHYDE PHOTOINITIATORS Arai, Tokuji (JP) 1983-01-25 US claimed
US-4291097-A PHOTOPOLYMERIZATION OF AN ACRYLIC ESTER MIXTURE WITH PHOSPHORIC ACID ESTER AND AN ETHANOLAMINE MITSUBISHI RAYON CO., LTD. (JP) 1981-09-22 US claimed
EP-0035574-A1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1981-09-16 EP claimed
EP-0012948-A1 Scratch-resistant, dyeable coating compositions for synthetic resin articles MITSUBISHI RAYON CO., LTD. (JP) 1980-07-09 EP claimed
EP-3929237-B1 COMPOSITE PARTICLES, COMPOSITE-PARTICLE COMPOSITION, AND METHOD FOR PRODUCING COMPOSITE-PARTICLE COMPOSITION TOPPAN INC (JP) 2025-07-09 EP disclosed
US-12195608-B2 Composite particles, composite-particle composition, and method for producing composite-particle composition TOPPAN INC. (JP) 2025-01-14 US disclosed
EP-3736297-B1 COMPOSITE PARTICLES, PRODUCTION METHOD FOR COMPOSITE PARTICLES, DRY POWDER, AND RESIN COMPOSITION FOR MOLDING TOPPAN PRINTING CO LTD (JP) 2024-10-16 EP disclosed
US-12075775-B2 Sustained-release composite particles, method for producing sustained-release composite particles, dry powder, and wallpaper TOPPAN PRINTING CO., LTD. (JP) 2024-09-03 US disclosed
CN-115838543-B Photopolymer composition and grating containing organosilicon film forming agent 杭州光粒科技有限公司 2024-06-07 CN disclosed
EP-0057906-A1 Coating composition and process for preparing synthetic resin shaped articles by using same MITSUBISHI RAYON CO., LTD. (JP) 1982-08-18 EP disclosed
US-4339474-A POLYFUNCTIONAL ACRYLATE, MONO- OR DIACRYLATE, ULTRAVIOLET ABSORBER, PHOTOINITIATOR MITSUBISHI RAYON COMPANY, LTD. (JP) 1982-07-13 US disclosed
US-4291097-A PHOTOPOLYMERIZATION OF AN ACRYLIC ESTER MIXTURE WITH PHOSPHORIC ACID ESTER AND AN ETHANOLAMINE MITSUBISHI RAYON CO., LTD. (JP) 1981-09-22 US disclosed
EP-0035272-A1 Coating composition and process for preparing synthetic resin shaped articles by using same MITSUBISHI RAYON CO., LTD. (JP) 1981-09-09 EP disclosed
US-4272607-A POLYMER OF A TETRAHYDROFURFURYL ACRYLATE, UNSATURATED COMPOUND AND INITIATOR HITACHI CHEMICAL COMPANY, LTD. (JP) 1981-06-09 US disclosed
EP-0012948-A1 Scratch-resistant, dyeable coating compositions for synthetic resin articles MITSUBISHI RAYON CO., LTD. (JP) 1980-07-09 EP disclosed