SCHEMBL2462425

SCHEMBL2462425

C[SiH2]OC(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.42
KIF11 P52732 1/20 0.40
ALDH1A1 P00352 3/20 0.39
ALOX15 P16050 1/20 0.39
KCNN4 O15554 5/20 0.37
TSHR P16473 2/20 0.36
TAAR1 Q96RJ0 1/20 0.34
ESR1 P03372 2/20 0.33
ESR2 Q92731 2/20 0.33
CYP3A4 P08684 1/20 0.33
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
CES1 P23141 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA5A P35218 1/20 0.32
CA9 Q16790 1/20 0.32
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5571950 0.79 KIF11 (0.43) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL4171312 0.78 MAPK1 (0.46) MAPK1ALDH1A1ALOX15KCNN4TSHR
SCHEMBL1315596 0.76 MAPK1 (0.44) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL29569674 0.75 KIF11 (0.40) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL232216 0.75 KIF11 (0.40) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL4281338 0.73 KCNN4 (0.38) MAPK1KIF11ALDH1A1ALOX15KCNN4
Methoxytriphenylmethane SCHEMBL9103 0.70 MAPK1 (0.48) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL9354093 0.70 KIF11 (0.37) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL4275846 0.70 KCNN4 (0.35) MAPK1KIF11ALDH1A1ALOX15KCNN4
SCHEMBL8973 0.69 KIF11 (0.48) MAPK1KIF11ALDH1A1ALOX15KCNN4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116888072-A Method for producing surface-treated fumed silica particles, and toner external additive for developing electrostatic images 信越化学工业株式会社 2023-10-13 CN disclosed
CN-107922694-B Process for producing low emission polypropylene SABIC环球技术有限责任公司 2023-08-15 CN disclosed
CN-116457424-A Organosilicon compound, hydrolysis condensate thereof, and coating composition 信越化学工业株式会社 2023-07-18 CN disclosed
US-8013060-B2 Method for concentrating organic silicate polymer solution LG CHEM, LTD. (KR) 2011-09-06 US disclosed
US-20100130683-A1 Method for Concentrating Organic Silicate Polymerite Solution LG CHEM, LTD (KR) 2010-05-27 US disclosed
US-20040033888-A1 Catalyst for polymerization and copolymerization of ethylene HANWHA TOTAL PETROCHEMICAL CO., LTD. (KR) 2004-02-19 US disclosed