SCHEMBL2464964

SCHEMBL2464964

CCC=COOCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27514819 0.78
SCHEMBL31091575 0.78 ALDH1A1 (0.33)
SCHEMBL31722926 0.76 ALDH1A1 (0.32)
SCHEMBL2465836 0.75
SCHEMBL2136647 0.75 TRPA1 (0.32)
SCHEMBL32669185 0.74 ADRB2 (0.35)
SCHEMBL30928731 0.74
SCHEMBL5676047 0.73
SCHEMBL12731060 0.73
SCHEMBL28875816 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12270810-B2 QMAX assay and applications (II) ESSENLIX CORPORATION (US) 2025-04-08 US claimed
US-12270810-B2 QMAX assay and applications (II) ESSENLIX CORPORATION (US) 2025-04-08 US disclosed
CN-103370827-B Ionic compound, method for producing same, and electrolyte solution and electricity storage device using same NIPPON SHOKUBAI CO.,LTD. (JP) 2016-02-17 CN disclosed
EP-2371912-B1 Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter FUJIFILM CORP (JP) 2014-04-30 EP disclosed
US-8573765-B2 Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
CN-103370827-A Ionic compound, method for producing same, and electrolyte solution and electricity storage device using same NIPPON CATALYTIC CHEM IND 2013-10-23 CN disclosed
US-20110241264-A1 ACTIVE RADIATION CURABLE INK COMPOSITION, INK COMPOSITION FOR INKJET RECORDING, PRINTED MATTER, AND METHOD OF PRODUCING MOLDED ARTICLE OF PRINTED MATTER FUJIFILM CORPORATION (JP) 2011-10-06 US disclosed
EP-2371912-A1 Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter Fujifilm Corporation (JP) 2011-10-05 EP disclosed