⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6053503 | 0.75 | CA1 (0.30) | — | |
| Sulfuric Acid SCHEMBL28799289 | 0.75 | CA5A (0.40) | — | |
| SCHEMBL2634583 | 0.73 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL7781126 | 0.73 | ALDH1A1 (0.39) | — | |
| SCHEMBL12770189 | 0.72 | ALDH1A1 (0.35) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL29596747 | 0.71 | ALDH1A1 (0.38) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL28499740 | 0.71 | ALDH1A1 (0.38) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL28236547 | 0.71 | ALDH1A1 (0.38) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL21176050 | 0.71 | CA1 (0.40) | — | |
| SCHEMBL6403542 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030027061-A1 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2003-02-06 | — | — | US | claimed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | claimed |
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | disclosed |
| US-9983477-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-05-29 | — | — | US | disclosed |
| US-9720321-B2 | Lactone photoacid generators and resins and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-08-01 | — | — | US | disclosed |
| EP-2267532-B1 | Photoacid generators and photoresists comprising same | ROHM & HAAS ELECT MAT (US) | 2015-08-19 | — | — | EP | disclosed |
| US-8349533-B2 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8338077-B2 | Photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-12-25 | — | — | US | disclosed |
| US-20120214100-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120129104-A1 | LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| EP-2452941-A1 | Lactone photoacid generators and resins and photoresists comprising same | Rohm and Haas Electronic Materials LLC (US) | 2012-05-16 | — | — | EP | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-6849374-B2 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-01 | — | — | US | disclosed |
| US-6849374-B2 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-01 | — | — | US | disclosed |
| WO-2002042845-A3 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY CO LLC (US) | 2004-01-08 | — | — | WO | disclosed |
| US-20030027061-A1 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2003-02-06 | — | — | US | disclosed |
| US-20030027061-A1 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2003-02-06 | — | — | US | disclosed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | disclosed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | disclosed |