SCHEMBL24707014

SCHEMBL24707014

CCC1(OC(=O)c2ccccc2C(=O)O)CCCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.45
CYP3A4 P08684 3/20 0.45
CYP2D6 P10635 2/20 0.45
CYP2C9 P11712 2/20 0.45
CYP2C19 P33261 2/20 0.45
ALDH1A1 P00352 5/20 0.44
ALOX15 P16050 1/20 0.42
TSHR P16473 3/20 0.42
L3MBTL1 Q9Y468 1/20 0.38
AKR1C1 Q04828 1/20 0.38
SCN1A P35498 2/20 0.37
SCN2A Q99250 2/20 0.37
SCN3A Q9NY46 2/20 0.37
PRCP P42785 1/20 0.37
SIGMAR1 Q99720 1/20 0.37
TP53 P04637 1/20 0.37
MAPK1 P28482 1/20 0.37
MEN1 O00255 1/20 0.37
CYP1A2 P05177 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6399681 0.98 TDP1 (0.44) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL6400218 0.92 TSHR (0.46) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL6405720 0.87 TDP1 (0.42) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL27006191 0.85 LMNA (0.49) TDP1CYP3A4CYP2C9CYP2C19ALDH1A1
SCHEMBL790335 0.85 ALDH1A1 (0.46) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL6402074 0.83 ALDH1A1 (0.42) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL3671321 0.83 LMNA (0.46) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL4580415 0.82 ALDH1A1 (0.49) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL9618428 0.81 LMNA (0.45) TDP1CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL1902158 0.80 CYP3A4 (0.36) TDP1CYP3A4CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220397825-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROLLING AGENT TOKYO OHKA KOGYO CO., LTD. (JP) 2022-12-15 US disclosed