Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 4/20 | 0.73 |
| ▸ | MAOB | P27338 | 6/20 | 0.58 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | MAPT | P10636 | 3/20 | 0.58 |
| ▸ | MAOA | P21397 | 3/20 | 0.56 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.55 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.55 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.55 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.55 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.55 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.55 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.55 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.55 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.55 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.55 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.55 |
| ▸ | MMP1 | P03956 | 1/20 | 0.53 |
| ▸ | MMP2 | P08253 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8395184 | 0.90 | MAOB (0.62) | APPMAOBCXCL12KDM4EALDH1A1 | |
| SCHEMBL8395187 | 0.90 | MAOB (0.62) | APPMAOBCXCL12KDM4EALDH1A1 | |
| SCHEMBL2622607 | 0.87 | HDAC3 (0.59) | APPMAOBMAOAHDAC6HDAC3 | |
| SCHEMBL5179114 | 0.87 | APP (0.94) | APPMAOBKDM4EALDH1A1MAPT | |
| SCHEMBL11439096 | 0.87 | APP (0.94) | APPMAOBKDM4EALDH1A1MAPT | |
| SCHEMBL11451994 | 0.87 | HDAC3 (0.59) | APPMAOBMAOAHDAC6HDAC3 | |
| SCHEMBL2829008 | 0.85 | APP (1.00) | APPMAOBKDM4EALDH1A1MAPT | |
| SCHEMBL21798645 | 0.85 | APP (1.00) | APPMAOBKDM4EALDH1A1MAPT | |
| SCHEMBL18417175 | 0.85 | HDAC3 (0.57) | APPMAOBMAOAHDAC6HDAC3 | |
| Parachlorophenol SCHEMBL10549360 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2370859-A2 | A PHOTOSENSITIVE COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2011-10-05 | — | — | EP | disclosed |
| WO-2010064135-A2 | A PHOTOSENSITIVE COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-06-10 | — | — | WO | disclosed |
| US-20100136477-A1 | Photosensitive Composition | AZ ELECTRONIC MATERIALS USA CORP. | 2010-06-03 | — | — | US | disclosed |
| EP-2111567-A2 | PHOTORESIST COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-10-28 | — | — | EP | disclosed |
| WO-2008096263-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-14 | — | — | WO | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| US-5350660-A | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |