Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.56 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.56 |
| ▸ | ESR1 | P03372 | 3/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.48 |
| ▸ | PRKCI | P41743 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29719025 | 1.00 | GABRA1 (0.56) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL45861 | 0.89 | GABRA1 (0.68) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL29429347 | 0.80 | GABRA1 (0.52) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL5678308 | 0.80 | GABRA1 (0.46) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL5445936 | 0.80 | PRKCI (0.60) | PRKCI | |
| SCHEMBL3191260 | 0.80 | GABRA1 (0.52) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL70108 | 0.80 | TYR (0.60) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL5589782 | 0.80 | GABRA1 (0.46) | GABRA1GABRB2ESR1ESR2PRKCI | |
| SCHEMBL28467454 | 0.80 | IAPP (0.49) | ESR1ESR2PRKCI | |
| SCHEMBL7939589 | 0.80 | DHFR (0.46) | GABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 299 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10597530-B2 | Polycarbonate compositions with improved flame retardance | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2020-03-24 | — | — | US | claimed |
| US-9228067-B2 | Flame-resistant polycarbonate film | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2016-01-05 | — | — | US | claimed |
| EP-2895537-A1 | FLAME-RESISTANT POLYCARBONATE FILM | SABIC Global Technologies B.V. (NL) | 2015-07-22 | — | — | EP | claimed |
| WO-2014043305-A1 | FLAME-RESISTANT POLYCARBONATE FILM | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2014-03-20 | — | — | WO | claimed |
| US-20140079934-A1 | FLAME-RESISTANT POLYCARBONATE FILM | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2014-03-20 | — | — | US | claimed |
| EP-1436341-B1 | POLYCARBONATE-SILOXANE COPOLYMERS | GEN ELECTRIC (US) | 2006-05-31 | — | — | EP | claimed |
| EP-0965067-B1 | POSITIVE PHOTORESISTS CONTAINING NOVEL PHOTOACTIVE COMPOUNDS | CLARIANT FINANCE BVI LTD (VG) | 2004-09-29 | — | — | EP | claimed |
| EP-1436341-A2 | POLYCARBONATE-SILOXANE COPOLYMERS | GENERAL ELECTRIC COMPANY (US) | 2004-07-14 | — | — | EP | claimed |
| US-6630525-B2 | Comprising residues of; dihydric phenol; and a siloxane functional bisphenol, optionally, a branching agent and optionally, a flame retardant | GENERAL ELECTRIC COMPANY | 2003-10-07 | — | — | US | claimed |
| WO-2003076489-A2 | POLYCARBONATE-SILOXANE COPOLYMERS | GENERAL ELECTRIC COMPANY (US) | 2003-09-18 | — | — | WO | claimed |
| US-5612164-A | Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone | HOECHST CELANESE CORPORATION (US) | 1997-03-18 | — | — | US | claimed |
| EP-0662222-B1 | POSITIVE-WORKING PHOTORESIST COMPOSITION | HOECHST CELANESE CORP (US) | 1997-01-22 | — | — | EP | claimed |
| US-5580700-A | PRE-PURIFYING, DEMETALLIZING THE ION EXCHANGE RESIN BY WASHING WITH WATER, MINERAL ACID SECOND | HOECHST CELANESE CORPORATION (US) | 1996-12-03 | — | — | US | claimed |
| WO-1996024886-A1 | PHOTOACTIVE COMPOUNDS | HOECHST CELANESE CORPORATION (US) | 1996-08-15 | — | — | WO | claimed |
| EP-0671025-A1 | METAL ION REDUCTION IN BOTTOM ANTI-REFLECTIVE COATINGS FOR PHOTORESISTS. | HOECHST CELANESE CORP (US) | 1995-09-13 | — | — | EP | claimed |
| US-5441997-A | Comprising fillers, stabilizers of phosphites, phosphates and styrene-rubber impact modifier | GENERAL ELECTRIC COMPANY (US) | 1995-08-15 | — | — | US | claimed |
| EP-0662222-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION. | HOECHST CELANESE CORP (US) | 1995-07-12 | — | — | EP | claimed |
| WO-1994012912-A1 | METAL ION REDUCTION IN BOTTOM ANTI-REFLECTIVE COATINGS FOR PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1994-06-09 | — | — | WO | claimed |
| US-5306802-A | Containing repeating units derived from bisphenol A and tetrahalobisphenol A, with trihalophenol end groups | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1994-04-26 | — | — | US | claimed |
| WO-1994008275-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION | HOECHST CELANESE CORPORATION (US) | 1994-04-14 | — | — | WO | claimed |