Sugi Predict

Sugi Predict / Compounds / SCHEMBL24760896

SCHEMBL24760896

SCHEMBL24760896

C/C=C/C1(N)C2CC3CC(C2)CC1C3

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 2/20 0.32
▸ SLC22A2 O15244 1/20 0.32
▸ SLC22A1 O15245 1/20 0.32
▸ GRIN2D O15399 1/20 0.32
▸ GRIN3B O60391 1/20 0.32
▸ TSHR P16473 1/20 0.32
▸ NFKB1 P19838 1/20 0.32
▸ STAT6 P42226 1/20 0.32
▸ GRIN1 Q05586 1/20 0.32
▸ GRIN2A Q12879 1/20 0.32
▸ GRIN2B Q13224 1/20 0.32
▸ GRIN2C Q14957 1/20 0.32
▸ GRIN3A Q8TCU5 1/20 0.32
▸ SLC47A1 Q96FL8 1/20 0.32
▸ SIGMAR1 Q99720 1/20 0.32
▸ POLB P06746 1/20 0.31
▸ THRB P10828 1/20 0.31
▸ BLM P54132 1/20 0.31
▸ PMP22 Q01453 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24760894 0.72 LMNA (0.33) LMNASLC22A2SLC22A1GRIN2DGRIN3B
SCHEMBL1237995 0.67 LMNA (0.38) LMNASLC22A2SLC22A1GRIN2DGRIN3B
SCHEMBL27309162 0.66 LMNA (0.42) LMNASLC22A2SLC22A1GRIN2DGRIN3B
Hydrochloric Acid SCHEMBL1237955 0.65 LMNA (0.41) LMNASLC22A2SLC22A1GRIN2DGRIN3B
SCHEMBL7457184 0.64 — —
SCHEMBL6494090 0.63 GRIN2D (0.36) LMNASLC22A2SLC22A1GRIN2DGRIN3B
SCHEMBL6494093 0.63 GRIN2D (0.36) LMNASLC22A2SLC22A1GRIN2DGRIN3B
SCHEMBL19083874 0.62 HSD11B1 (0.41) —
SCHEMBL6526108 0.62 GRIN2D (0.40) LMNASLC22A2SLC22A1GRIN2DGRIN3B
Hydrochloric Acid SCHEMBL15211145 0.60 GRIN2D (0.39) LMNASLC22A2SLC22A1GRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135498-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2024-06-27 — — WO disclosed
WO-2024127977-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-20 — — WO disclosed
WO-2024043098-A1 RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF 東京応化工業株式会社 2024-02-29 — — WO disclosed
WO-2024043121-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR 東京応化工業株式会社 2024-02-29 — — WO disclosed
WO-2023171743-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER 東京応化工業株式会社 2023-09-14 — — WO disclosed
WO-2023145535-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2023-08-03 — — WO disclosed
WO-2023068251-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2023-04-27 — — WO disclosed
WO-2023013592-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 東京応化工業株式会社 2023-02-09 — — WO disclosed
WO-2022270627-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 東京応化工業株式会社 2022-12-29 — — WO disclosed
WO-2022265002-A1 RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD 東京応化工業株式会社 2022-12-22 — — WO disclosed
WO-2022265034-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS 東京応化工業株式会社 2022-12-22 — — WO disclosed
WO-2022264845-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 東京応化工業株式会社 2022-12-22 — — WO disclosed