Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.33 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | STAT6 | P42226 | 1/20 | 0.33 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.33 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.33 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.33 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.33 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.33 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL493635 | 0.74 | HSD11B1 (0.32) | TP53GAAMAPTSMN1; SMN2 | |
| SCHEMBL26863267 | 0.73 | HSD11B1 (0.32) | LMNASLC22A2SLC22A1GRIN2DGRIN3B | |
| SCHEMBL26863268 | 0.73 | HSD11B1 (0.32) | LMNASLC22A2SLC22A1GRIN2DGRIN3B | |
| SCHEMBL24760895 | 0.73 | PKM (0.35) | LMNASLC22A2SLC22A1GRIN2DGRIN3B | |
| SCHEMBL26869807 | 0.73 | HSD11B1 (0.32) | LMNASLC22A2SLC22A1GRIN2DGRIN3B | |
| SCHEMBL26869806 | 0.73 | HSD11B1 (0.32) | LMNASLC22A2SLC22A1GRIN2DGRIN3B | |
| SCHEMBL3147949 | 0.72 | MAPT (0.34) | TP53GAAMAPT | |
| SCHEMBL24760896 | 0.72 | LMNA (0.32) | LMNASLC22A2SLC22A1GRIN2DGRIN3B | |
| SCHEMBL24776305 | 0.69 | — | — | |
| SCHEMBL17338022 | 0.69 | ALDH1A1 (0.32) | SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024043121-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2024043098-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2023223897-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023195407-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| WO-2023176546-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2023-09-21 | — | — | WO | disclosed |
| WO-2023171670-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023145535-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-08-03 | — | — | WO | disclosed |
| WO-2022270627-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-29 | — | — | WO | disclosed |
| WO-2022264941-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022265002-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |