SCHEMBL2476465

SCHEMBL2476465

OC1CCCC2C3C=CC(C3)C12

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.34
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14531158 1.00 HSD11B1 (0.34) HSD11B1ALDH1A1
SCHEMBL5011795 0.86 ALDH1A1 (0.33) HSD11B1ALDH1A1
SCHEMBL29743084 0.77 HSD11B1 (0.38) HSD11B1ALDH1A1
SCHEMBL3986309 0.75 ALDH1A1 (0.42) HSD11B1ALDH1A1
SCHEMBL199996 0.75 ALDH1A1 (0.42) HSD11B1ALDH1A1
SCHEMBL200912 0.74 ALDH1A1 (0.31) HSD11B1ALDH1A1
SCHEMBL4702278 0.74 THRB (0.32) HSD11B1ALDH1A1
Methyl Alcohol SCHEMBL4202813 0.74 HSD11B1 (0.39) HSD11B1ALDH1A1
SCHEMBL1377155 0.72 ALDH1A1 (0.31) HSD11B1ALDH1A1
Ethylene SCHEMBL774849 0.71 ALDH1A1 (0.39) HSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1078945-B1 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO LTD (KR) 2011-10-12 EP disclosed
US-7838088-B2 Cyclic olefin-based polymer, and optical material, polarizing plate and liquid crystal display device using the same FUJIFILM CORPORATION (JP) 2010-11-23 US disclosed
US-7838088-B2 Cyclic olefin-based polymer, and optical material, polarizing plate and liquid crystal display device using the same FUJIFILM CORPORATION (JP) 2010-11-23 US disclosed
US-20090040436-A1 Cyclic Olefin-Based Polymer, and Optical Material, Polarizing Plate and Liquid Crystal Display Device Using the Same FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed
US-20090040436-A1 Cyclic Olefin-Based Polymer, and Optical Material, Polarizing Plate and Liquid Crystal Display Device Using the Same FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed
US-20080299329-A1 CYCLIC OLEFIN POLYMER, OPTICAL MATERIAL, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY FUJIFILM CORPORATION (JP) 2008-12-04 US disclosed
US-20080299329-A1 CYCLIC OLEFIN POLYMER, OPTICAL MATERIAL, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY FUJIFILM CORPORATION (JP) 2008-12-04 US disclosed
US-7199074-B2 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2007-04-03 US disclosed
US-7172986-B2 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2007-02-06 US disclosed
US-7087687-B2 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2006-08-08 US disclosed
EP-1607413-A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2005-12-21 EP disclosed
EP-1607414-A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2005-12-21 EP disclosed
US-20050277569-A1 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY 2005-12-15 US disclosed
US-20050277749-A1 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY 2005-12-15 US disclosed
US-20050043494-A1 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY 2005-02-24 US disclosed
EP-1508577-A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2005-02-23 EP disclosed
US-6642336-B1 Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance SAMSUNG ELECTRONICS CO., LTD. (KR) 2003-11-04 US disclosed
EP-1078945-A2 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO. LTD. (KR) 2001-02-28 EP disclosed