Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.58 |
| ▸ | HPGD | P15428 | 3/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | MEN1 | O00255 | 2/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.58 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.58 |
| ▸ | GLA | P06280 | 1/20 | 0.58 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.58 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | THRB | P10828 | 1/20 | 0.52 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.52 |
| ▸ | ATIC | P31939 | 1/20 | 0.52 |
| ▸ | DHODH | Q02127 | 3/20 | 0.48 |
| ▸ | PDE10A | Q9Y233 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL70004 | 0.89 | KDM4E (0.68) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| Benzene SCHEMBL10558251 | 0.89 | KDM4E (0.68) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL29599456 | 0.89 | KDM4E (0.68) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL28261469 | 0.88 | DHODH (0.52) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL31414101 | 0.87 | HSD17B10 (0.54) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL29260803 | 0.87 | DHODH (0.55) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL4415520 | 0.87 | HSD17B10 (0.54) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL31436571 | 0.87 | KDM4E (0.65) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| Hydrochloric Acid SCHEMBL21173958 | 0.87 | KDM4E (0.65) | HSD17B10HPGDKDM4EALDH1A1MEN1 | |
| SCHEMBL901598 | 0.86 | HSD17B10 (0.48) | HSD17B10HPGDKDM4EALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2866093-A1 | Anti-reflective coating forming composition containing vinyl ether compound and polyimide | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2015-04-29 | — | — | EP | disclosed |
| CN-102981368-B | Antireflective film-forming composition containing vinyl ether compound | NISSAN CHEMICAL IND LTD | 2015-03-04 | — | — | CN | disclosed |
| US-8501393-B2 | Lithography; photoresists; semiconductors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| CN-1954265-B | Composition for forming antireflection film containing vinyl ether compound | NISSAN CHEMICAL IND LTD | 2013-03-20 | — | — | CN | disclosed |
| CN-102981368-A | Antireflective film-forming composition containing vinyl ether compound | NISSAN CHEMICAL INDUSTRY LTD | 2013-03-20 | — | — | CN | disclosed |
| WO-2012030114-A3 | CATHODE ACTIVE MATERIAL FOR SECONDARY BATTERY | 주식회사 엘지화학 (KR) | 2012-05-10 | — | — | WO | disclosed |
| EP-2111983-B1 | Image recording material and method for its preparation | FUJIFILM CORP (JP) | 2011-10-12 | — | — | EP | disclosed |
| EP-1439058-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-12-23 | — | — | EP | disclosed |
| EP-2111983-A1 | Image recording material and method for its' preparation | Fujifilm Corporation (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-1914070-B1 | Image recording material and lithographic printing plate precursor | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-6423467-B1 | USEFUL IN A LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-20020094490-A1 | An aluminum plate is subjected to graining, alkali etching and anodizing, a photosensitive layer becomes alkali-soluble by photothermal conversion with laser beams | FUJIFILM CORPORATION (JP) | 2002-07-18 | — | — | US | disclosed |
| US-20020086233-A1 | Useful in a lithographic printing plates | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-20020055058-A1 | Image forming layer containing a polymer or compound having a a fluoroaliphatic side chain which is a telomer or oligomer of tetraethylene; excellent uniformity, high contrast and resolution; good inking; durability; white light safety | FUJI PHOTO FILM CO., LTD. | 2002-05-09 | — | — | US | disclosed |
| US-20020051929-A1 | Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life | FUJIFILM CORPORATION (JP) | 2002-05-02 | — | — | US | disclosed |
| CN-1326861-A | Support for lithographic printing plate and photosensitive resin lithographic plate | FUJI PHOTO FILM CO LTD (JP) | 2001-12-19 | — | — | CN | disclosed |
| EP-1157854-A2 | Support for lithographic printing plate and presensitized plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |
| US-6277541-B1 | MULTILAYER; ALUMINUM, ALUMINA AND ALKALI-SOLUBLE POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 2001-08-21 | — | — | US | disclosed |
| EP-0965887-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-12-22 | — | — | EP | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |