SCHEMBL2479461

SCHEMBL2479461

CCCCc1ccccc1[S+](c1ccccc1)c1ccccc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 6/20 0.34
CA1 P00915 2/20 0.30
CA2 P00918 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3787592 0.99 KCNH2 (0.34) KCNH2CA2
SCHEMBL4619645 0.90 HSD11B1 (0.34) CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL5145136 0.87 KCNH2 (0.44) KCNH2
SCHEMBL3136335 0.83 PTGDR2 (0.36) KCNH2CA1CA2
SCHEMBL3260155 0.83 PTGDR2 (0.36) KCNH2CA1CA2
SCHEMBL2634332 0.81 PTGDR2 (0.37) KCNH2CA1CA2
SCHEMBL2003359 0.81 CA1 (0.35) CA1CA2
SCHEMBL2634639 0.80 CA1 (0.33) CA1CA2
SCHEMBL1516293 0.80 HSD11B1 (0.36) CA1CA2
SCHEMBL31290709 0.80 CA1 (0.33) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2376982-A1 SUBSTRATE PLANARIZATION WITH IMPRINT MATERIALS AND PROCESSES International Business Machines Corporation (US) 2011-10-19 EP disclosed
WO-2010080758-A1 SUBSTRATE PLANARIZATION WITH IMPRINT MATERIALS AND PROCESSES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-07-15 WO disclosed
EP-1716450-A4 USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES IBM (US) 2007-06-27 EP disclosed
EP-1716450-A1 USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES International Business Machines Corporation (US) 2006-11-02 EP disclosed
WO-2005088393-A1 USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-09-22 WO disclosed