Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 14/20 | 0.35 |
| ▸ | CA2 | P00918 | 14/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.35 |
| ▸ | MMP1 | P03956 | 4/20 | 0.32 |
| ▸ | MMP2 | P08253 | 4/20 | 0.32 |
| ▸ | MMP9 | P14780 | 4/20 | 0.32 |
| ▸ | MMP8 | P22894 | 4/20 | 0.32 |
| ▸ | MMP13 | P45452 | 4/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1516293 | 0.99 | HSD11B1 (0.36) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL31627575 | 0.92 | CA2 (0.38) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL956713 | 0.92 | CA2 (0.38) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL30897218 | 0.91 | HSD11B1 (0.39) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL2634848 | 0.91 | HSD11B1 (0.39) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL4619645 | 0.86 | HSD11B1 (0.34) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL1815362 | 0.86 | HSD11B1 (0.36) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL2634639 | 0.86 | CA1 (0.33) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL31290709 | 0.86 | CA1 (0.33) | CA1CA2HSD11B1MMP1MMP2 | |
| SCHEMBL31290710 | 0.86 | CA1 (0.33) | CA1CA2HSD11B1MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8202678-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | claimed |
| US-7651831-B2 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-01-26 | — | — | US | claimed |
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | claimed |
| EP-2013659-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | International Business Machines Corporation IBM (US) | 2009-01-14 | — | — | EP | claimed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | claimed |
| EP-1664923-A4 | NEGATIVE RESIST COMPOSITION WITH FLUOROSULFONAMIDE-CONTAINING POLYMER | IBM (US) | 2008-08-27 | — | — | EP | claimed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | claimed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | claimed |
| US-7235342-B2 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-06-26 | — | — | US | claimed |
| US-7217496-B2 | Fluorinated photoresist materials with improved etch resistant properties | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-05-15 | — | — | US | claimed |
| US-7011923-B2 | comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-14 | — | — | US | claimed |
| US-6991890-B2 | Negative photoresist composition involving non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-01-31 | — | — | US | claimed |
| US-20050227167-A1 | Negative photoresist and method of using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-10-13 | — | — | US | claimed |
| US-6949325-B2 | Negative resist composition with fluorosulfonamide-containing polymer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-09-27 | — | — | US | claimed |
| US-20050202339-A1 | Negative photoresist and method of using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-09-15 | — | — | US | claimed |
| US-20050175928-A1 | Negative photoresist composition involving non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-08-11 | — | — | US | claimed |
| US-20050164507-A1 | Negative photoresist composition including non-crosslinking chemistry | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-07-28 | — | — | US | claimed |
| US-20050153232-A1 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-07-14 | — | — | US | claimed |
| WO-2005036261-A1 | NEGATIVE RESIST COMPOSITION WITH FLUOROSULFONAMIDE-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-04-21 | — | — | WO | claimed |
| US-20050058930-A1 | Negative resist composition with fluorosulfonamide-containing polymer | GLOBALFOUNDRIES U.S. INC. | 2005-03-17 | — | — | US | claimed |