Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 6/20 | 0.34 |
| ▸ | MMP1 | P03956 | 3/20 | 0.30 |
| ▸ | MMP2 | P08253 | 3/20 | 0.30 |
| ▸ | MMP9 | P14780 | 3/20 | 0.30 |
| ▸ | MMP8 | P22894 | 3/20 | 0.30 |
| ▸ | MMP13 | P45452 | 3/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2479461 | 0.99 | KCNH2 (0.34) | KCNH2CA2 | |
| SCHEMBL4619645 | 0.88 | HSD11B1 (0.34) | MMP1MMP2MMP9MMP8MMP13 | |
| Trifluoromethanesulfonic Acid SCHEMBL5145136 | 0.88 | KCNH2 (0.44) | KCNH2 | |
| SCHEMBL2634332 | 0.82 | PTGDR2 (0.37) | KCNH2CA2 | |
| SCHEMBL3136335 | 0.81 | PTGDR2 (0.36) | KCNH2CA2 | |
| SCHEMBL3260155 | 0.81 | PTGDR2 (0.36) | KCNH2CA2 | |
| SCHEMBL1516293 | 0.81 | HSD11B1 (0.36) | MMP1MMP2MMP9MMP8MMP13 | |
| SCHEMBL4999349 | 0.80 | — | — | |
| SCHEMBL2003359 | 0.80 | CA1 (0.35) | MMP1MMP2MMP9MMP8MMP13 | |
| SCHEMBL548554 | 0.79 | CA1 (0.32) | MMP1MMP2MMP9MMP8MMP13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2012067755-A2 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-24 | — | — | WO | disclosed |
| WO-2010086288-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS AND METHOD OF FORMING A PATTERN USING IT | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-05 | — | — | WO | disclosed |