Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.35 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.35 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.35 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.35 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.35 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.35 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25899548 | 0.81 | TRPA1 (0.49) | KDM4ETRPA1KMT2A | |
| SCHEMBL23812298 | 0.79 | CFD (0.42) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL31124129 | 0.76 | EGFR (0.47) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL23812340 | 0.76 | EGFR (0.47) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL24809995 | 0.76 | HPGD (0.35) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL16683026 | 0.76 | PTGS2 (0.37) | KDM4ETRPA1TUBB1 | |
| SCHEMBL24811292 | 0.75 | HPGD (0.35) | KDM4EKMT2ATUBB1MEN1 | |
| SCHEMBL24812500 | 0.74 | ELANE (0.43) | KDM4EKMT2AMEN1NPC1RAB9A | |
| SCHEMBL25561430 | 0.74 | TRPA1 (0.42) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL19823831 | 0.74 | MCL1 (0.38) | GABRA1GABRG2GABRB3GABRA5GABRA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220413385-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2022-12-29 | — | — | US | disclosed |