Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM2 | Q14416 | 12/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | GPR139 | Q6DWJ6 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | APAF1 | O14727 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL974763 | 0.88 | GRM2 (0.46) | GRM2NPSR1GPR139NPC1 | |
| SCHEMBL10956553 | 0.80 | GRM2 (0.45) | GRM2NPC1 | |
| SCHEMBL4233106 | 0.78 | GRM2 (0.49) | GRM2NPSR1NPC1 | |
| SCHEMBL975383 | 0.78 | GRM2 (0.46) | GRM2NPC1 | |
| SCHEMBL513590 | 0.78 | SLC9A1 (0.56) | GRM2NPSR1NPC1RAB9ASMN1; SMN2 | |
| SCHEMBL974069 | 0.77 | GRM2 (0.40) | GRM2NPSR1GPR139NPC1SMN1; SMN2 | |
| SCHEMBL19700841 | 0.77 | GRM2 (0.41) | GRM2NPSR1GPR139NPC1SMN1; SMN2 | |
| SCHEMBL19911462 | 0.77 | GRM2 (0.47) | GRM2GPR139NPC1 | |
| SCHEMBL21184979 | 0.76 | GRM2 (0.42) | GRM2NPSR1GPR139 | |
| SCHEMBL4218372 | 0.75 | NPSR1 (0.51) | GRM2NPSR1GPR139NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9486892-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2016-11-08 | — | — | US | claimed |
| US-8864860-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2014-10-21 | — | — | US | claimed |
| US-20250189895-A1 | METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| WO-2025105122-A1 | METHOD FOR MANUFACTURING MODIFIED SUBSTRATE, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND KIT | 富士フイルム株式会社 | 2025-05-22 | — | — | WO | disclosed |
| US-11992914-B2 | Polishing composition, polishing method, and method for producing substrate | FUJIMI INCORPORATED (JP) | 2024-05-28 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| CN-114995059-A | Resin, resist composition, and method for producing resist pattern | 住友化学株式会社 | 2022-09-02 | — | — | CN | disclosed |
| CN-110045013-B | Acoustic wave sensor and method of sensing gas phase analytes | 罗门哈斯电子材料有限责任公司 | 2022-08-26 | — | — | CN | disclosed |
| CN-106019832-B | Resin, resist composition, and method for producing resist pattern | 住友化学株式会社 | 2022-07-01 | — | — | CN | disclosed |
| US-11339310-B2 | Polishing composition | FUJIMI INCORPORATED | 2022-05-24 | — | — | US | disclosed |
| CN-114364780-A | Treatment liquid, kit, method for producing treatment liquid, method for cleaning substrate, and method for treating substrate | 富士胶片株式会社 | 2022-04-15 | — | — | CN | disclosed |
| EP-2693459-A1 | POLISHING COMPOSITION AND POLISHING METHOD | Fujimi Incorporated (JP) | 2014-02-05 | — | — | EP | disclosed |
| US-20140014872-A1 | POLISHING COMPOSITION AND POLISHING METHOD | FUJIMI INCORPORATED (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130203254-A1 | POLISHING COMPOSITION AND POLISHING METHOD | FUJIMI INCORPORATED (JP) | 2013-08-08 | — | — | US | disclosed |
| EP-2605270-A1 | POLISHING COMPOSITION AND POLISHING METHOD | Fujimi Incorporated (JP) | 2013-06-19 | — | — | EP | disclosed |
| US-20120153218-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20110250754-A1 | Polishing Composition and Polishing Method | FIJIMI INCORPORATED (JP) | 2011-10-13 | — | — | US | disclosed |
| EP-2374852-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2011-10-12 | — | — | EP | disclosed |
| US-20090179172-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2009-07-16 | — | — | US | disclosed |
| US-20090173910-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2009-07-09 | — | — | US | disclosed |