Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM2 | Q14416 | 15/20 | 0.46 |
| ▸ | SLC9A1 | P19634 | 2/20 | 0.37 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10956553 | 0.84 | GRM2 (0.45) | GRM2NPC1 | |
| SCHEMBL974069 | 0.84 | GRM2 (0.40) | GRM2NPC1 | |
| SCHEMBL17728249 | 0.83 | GRM2 (0.46) | GRM2SLC9A1TLR8 | |
| SCHEMBL30627901 | 0.83 | GRM2 (0.46) | GRM2SLC9A1TLR8 | |
| SCHEMBL6241554 | 0.83 | GRM2 (0.46) | GRM2SLC9A1TLR8 | |
| SCHEMBL19700841 | 0.83 | GRM2 (0.41) | GRM2SLC9A1TLR8NPC1 | |
| SCHEMBL17828279 | 0.82 | GRM2 (0.67) | GRM2SLC9A1TLR8NPC1 | |
| SCHEMBL974763 | 0.80 | GRM2 (0.46) | GRM2NPC1 | |
| SCHEMBL19911457 | 0.79 | GRM2 (0.69) | GRM2SLC9A1TLR8NPC1 | |
| SCHEMBL4233106 | 0.78 | GRM2 (0.49) | GRM2SLC9A1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4700821-A1 | TREATMENT SOLUTION AND METHOD FOR TREATING OBJECT TO BE TREATED | FUJIFILM Corporation (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260028558-A1 | TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED | FUJIFILM CORP (JP) | 2026-01-29 | — | — | US | disclosed |
| US-20250377594-A1 | RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-12-11 | — | — | US | disclosed |
| US-12481218-B2 | Treatment liquid, method for washing substrate, and method for removing resist | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250321482-A1 | RESIST COMPOSITION, DRY FILM RESIST, METHOD FOR PRODUCING DRY FILM RESIST, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED OBJECT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-12441965-B2 | Treatment liquid and substrate washing method | FUJIFILM CORPORATION (JP) | 2025-10-14 | — | — | US | disclosed |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| US-20250231484-A1 | RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-07-17 | — | — | US | disclosed |
| US-20250197783-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-19 | — | — | US | disclosed |
| US-12275921-B2 | Treatment liquid and substrate treatment method | FUJIFILM CORPORATION (JP) | 2025-04-15 | — | — | US | disclosed |
| US-20060014110-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA | 2006-01-19 | — | — | US | disclosed |
| US-20050187118-A1 | Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiring | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| US-20050176259-A1 | Method for removing photoresist | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-08-11 | — | — | US | disclosed |
| EP-1550912-A1 | METHOD FOR REMOVING PHOTORESIST | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-07-06 | — | — | EP | disclosed |
| US-20050019688-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA (JP) | 2005-01-27 | — | — | US | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6638899-B1 | Solution which comprises salt of hydrofluoric acid with base free from metal ions, water soluble organic solvent, basic substance and water, and which has pH value of from 8.5 to 10.0 | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030138737-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030134234-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | WAKIYA KAZUMASA (JP) | 2003-07-17 | — | — | US | disclosed |
| US-20010021489-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-09-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260028558-A1 | TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED | AOC1, EPCAM, AOC2 | GRM2 2990/4885SLC9A1 347/4885TLR8 1259/4885 |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ABCC1, SLC11A2, RER1 | GRM2 342/4885SLC9A1 2203/4885TLR8 3083/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.