Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC9A1 | P19634 | 8/20 | 0.56 |
| ▸ | APAF1 | O14727 | 1/20 | 0.55 |
| ▸ | POLB | P06746 | 1/20 | 0.55 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.48 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 4/20 | 0.47 |
| ▸ | NPC1 | O15118 | 3/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | MGAM | O43451 | 2/20 | 0.47 |
| ▸ | AMY1A | P0DUB6 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | SI | P14410 | 2/20 | 0.47 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11536431 | 0.88 | SLC9A1 (0.56) | SLC9A1APAF1POLBGRM2ALDH1A1 | |
| SCHEMBL10605831 | 0.87 | SLC9A1 (0.59) | SLC9A1APAF1POLBGRM2KCNMA1 | |
| SCHEMBL11537105 | 0.86 | SLC9A1 (0.54) | SLC9A1APAF1POLBGRM2ALDH1A1 | |
| SCHEMBL11535922 | 0.82 | SLC9A1 (0.53) | SLC9A1APAF1POLBGRM2ALDH1A1 | |
| SCHEMBL11536535 | 0.82 | SLC9A1 (0.53) | SLC9A1APAF1POLBGRM2ALDH1A1 | |
| SCHEMBL2479194 | 0.81 | RAB9A (0.43) | APAF1POLBKCNMA1RAB9ANPC1 | |
| SCHEMBL11442537 | 0.79 | APAF1 (0.68) | SLC9A1APAF1POLBGRM2ALDH1A1 | |
| SCHEMBL3675871 | 0.78 | SLC9A1 (0.59) | SLC9A1APAF1POLBGRM2KCNMA1 | |
| SCHEMBL8631037 | 0.78 | SLC9A1 (0.59) | SLC9A1APAF1POLBGRM2KCNMA1 | |
| SCHEMBL283984 | 0.78 | SLC9A1 (0.65) | SLC9A1APAF1POLBGRM2KCNMA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9486892-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2016-11-08 | — | — | US | claimed |
| US-8864860-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2014-10-21 | — | — | US | claimed |
| US-20070181534-A1 | Barrier polishing liquid and chemical mechanical polishing method | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | claimed |
| US-20040134376-A1 | Polishing composition | FUJIMI INCORPORATED (JP) | 2004-07-15 | — | — | US | claimed |
| US-4177155-A | N-AMINOMETHYL-TRIAZOLES AND IMIDAZOLES FOR MAKING ANTIFREEZES NONCORROSIVE | CIBA-GEIGY CORPORATION (US) | 1979-12-04 | — | — | US | claimed |
| EP-4471834-B1 | POLISHING SOLUTION AND POLISHING METHOD | FUJIFILM CORP (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-20250189895-A1 | METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| WO-2025105122-A1 | METHOD FOR MANUFACTURING MODIFIED SUBSTRATE, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND KIT | 富士フイルム株式会社 | 2025-05-22 | — | — | WO | disclosed |
| EP-4471834-A1 | POLISHING SOLUTION AND POLISHING METHOD | FUJIFILM Corporation (JP) | 2024-12-04 | — | — | EP | disclosed |
| US-20240368428-A1 | POLISHING LIQUID AND POLISHING METHOD | FUJIFILM CORPORATION (JP) | 2024-11-07 | — | — | US | disclosed |
| US-11992914-B2 | Polishing composition, polishing method, and method for producing substrate | FUJIMI INCORPORATED (JP) | 2024-05-28 | — | — | US | disclosed |
| WO-2023140049-A1 | POLISHING SOLUTION AND POLISHING METHOD | 富士フイルム株式会社 | 2023-07-27 | — | — | WO | disclosed |
| EP-1640424-A1 | Polishing composition and process for producing wiring structure using it | FUJIMI INCORPORATED (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20060060974-A1 | Polishing composition and process for producing wiring structure using it | FUJIMI INCORPORATED (JP) | 2006-03-23 | — | — | US | disclosed |
| US-20050208761-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1577357-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-21 | — | — | EP | disclosed |
| US-20050108949-A1 | Polishing composition | FUJIMI INCORPORATED (JP) | 2005-05-26 | — | — | US | disclosed |
| EP-1520892-A2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2005-04-06 | — | — | EP | disclosed |
| US-4268610-A | Photoresist formulations | HERCULES INCORPORATED (US) | 1981-05-19 | — | — | US | disclosed |
| US-4177155-A | N-AMINOMETHYL-TRIAZOLES AND IMIDAZOLES FOR MAKING ANTIFREEZES NONCORROSIVE | CIBA-GEIGY CORPORATION (US) | 1979-12-04 | — | — | US | disclosed |