SCHEMBL24846704

SCHEMBL24846704

O=C(Oc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F)c1ccccc1O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HPGD P15428 6/20 0.49
▸ HSD17B10 Q99714 4/20 0.49
▸ ALOX15 P16050 1/20 0.49
▸ TSHR P16473 2/20 0.47
▸ LMNA P02545 1/20 0.47
▸ ALDH1A1 P00352 5/20 0.45
▸ KDM4E B2RXH2 5/20 0.45
▸ TDP1 Q9NUW8 2/20 0.41
▸ CA1 P00915 3/20 0.38
▸ CA2 P00918 3/20 0.38
▸ CA12 O43570 2/20 0.38
▸ CA7 P43166 2/20 0.38
▸ CA13 Q8N1Q1 1/20 0.38
▸ CA9 Q16790 2/20 0.37
▸ HMGB1 P09429 1/20 0.37
▸ CA4 P22748 1/20 0.37
▸ CA6 P23280 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ NAPRT Q6XQN6 1/20 0.37
▸ CA14 Q9ULX7 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27397636 0.87 HPGD (0.40) HPGDHSD17B10ALOX15TSHRLMNA
SCHEMBL13713552 0.80 TSHR (0.43) TSHRLMNAALDH1A1TDP1CA1
SCHEMBL24846701 0.79 KMT2A (0.31) ALDH1A1CA1CA2CA12CA7
SCHEMBL12919770 0.79 HSD17B10 (0.64) HPGDHSD17B10ALOX15TSHRLMNA
SCHEMBL5889541 0.75 TSHR (0.47) HPGDHSD17B10ALOX15TSHRLMNA
SCHEMBL26938013 0.72 TTR (0.37) POLB
SCHEMBL9304475 0.71 HSD17B10 (0.58) HPGDHSD17B10ALOX15TSHRLMNA
SCHEMBL27633400 0.71 HPGD (0.67) HPGDHSD17B10ALOX15TSHRLMNA
Methyl Salicylate SCHEMBL4914591 0.71 TSHR (0.85) HPGDHSD17B10ALOX15TSHRLMNA
SCHEMBL25139369 0.71 HTT (0.46) HPGDHSD17B10TSHRALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023157455-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2023-08-24 — — WO disclosed
WO-2023119910-A1 RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, ACID GENERATOR, AND COMPOUND JSR株式会社 2023-06-29 — — WO disclosed
WO-2023276538-A1 RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND JSR株式会社 2023-01-05 — — WO disclosed
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