SCHEMBL26938013

SCHEMBL26938013

O=C(Oc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F)c1cc(I)cc(I)c1O

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 1/20 0.37
▸ POLB P06746 1/20 0.30
▸ NLRP3 Q96P20 1/20 0.30
▸ ERN1 O75460 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22866012 0.88 POLB (0.33) POLBNLRP3
SCHEMBL26037226 0.79 ACP1 (0.30) TTR
SCHEMBL26816354 0.76 F2 (0.33) —
SCHEMBL24846701 0.75 KMT2A (0.31) —
SCHEMBL26206412 0.74 CA12 (0.35) —
SCHEMBL24846704 0.72 HPGD (0.49) POLB
SCHEMBL24021501 0.71 — —
SCHEMBL30486727 0.70 TTR (0.54) TTRPOLBERN1
SCHEMBL7034885 0.70 TTR (0.54) TTRPOLBERN1
SCHEMBL19678513 0.69 POLB (0.34) POLBNLRP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230400768-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN JSR CORPORATION (JP) 2023-12-14 — — US disclosed
US-20230400768-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN JSR CORPORATION (JP) 2023-12-14 — — US disclosed
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