⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4537972 | 0.86 | — | — | |
| SCHEMBL10342220 | 0.86 | — | — | |
| SCHEMBL25140016 | 0.80 | ESR2 (0.36) | — | |
| SCHEMBL970210 | 0.79 | ESR1 (0.31) | — | |
| SCHEMBL31448050 | 0.79 | ESR1 (0.31) | — | |
| SCHEMBL2490977 | 0.78 | CA12 (0.30) | — | |
| SCHEMBL6903841 | 0.76 | ERN1 (0.39) | — | |
| SCHEMBL20076508 | 0.74 | ESR1 (0.33) | — | |
| SCHEMBL16958836 | 0.73 | CES2 (0.43) | — | |
| SCHEMBL27620378 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1410109-B1 | PHOTOSENSITIVE RESIN COMPOSITION | BASF SE (DE) | 2011-10-26 | — | — | EP | disclosed |
| US-7829257-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORP. (US) | 2010-11-09 | — | — | US | disclosed |
| EP-1395615-B1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | BASF SE (DE) | 2009-10-21 | — | — | EP | disclosed |
| US-7563505-B2 | Long-time stable water-repellent and oil-repellent surface | SUNYX SURFACE NANOTECHNOLOGIES GMBH (DE) | 2009-07-21 | — | — | US | disclosed |
| US-7556843-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2009-07-07 | — | — | US | disclosed |
| EP-2055709-A2 | Novel red electroluminescent compounds and organic electroluminescent device using the same | Gracel Display Inc. (KR) | 2009-05-06 | — | — | EP | disclosed |
| US-7425585-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2008-09-16 | — | — | US | disclosed |
| US-7381842-B2 | Oxime ester photoinitiators | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2008-06-03 | — | — | US | disclosed |
| US-20070259278-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2007-11-08 | — | — | US | disclosed |
| US-20070249748-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2007-10-25 | — | — | US | disclosed |
| EP-0152425-A1 | STABLE DISPERSIONS OF ORGANIC POLYMERS IN POLYEPOXIDES. | DOW CHEMICAL CO (US) | 1985-08-28 | — | — | EP | disclosed |
| WO-1985000610-A1 | STABLE DISPERSIONS OF ORGANIC POLYMERS IN POLYEPOXIDES | THE DOW CHEMICAL COMPANY (US) | 1985-02-14 | — | — | WO | disclosed |
| US-4477525-A | Graft polyesters and sized textiles | BASF WYANDOTTE CORPORATION (US) | 1984-10-16 | — | — | US | disclosed |
| US-4367308-A | Cross-linked graft polyesters and sized textiles | BASF WYANDOTTE CORPORATION (US) | 1983-01-04 | — | — | US | disclosed |
| US-4275176-A | Graft polyesters and sized textiles | BASF WYANDOTTE CORPORATION (US) | 1981-06-23 | — | — | US | disclosed |
| US-4263337-A | Sizing textile with in situ graft polyester | BASF WYANDOTTE CORPORATION (US) | 1981-04-21 | — | — | US | disclosed |
| US-4259457-A | Graft polyesters and sized textiles | BASF WYANDOTTE CORPORATION (US) | 1981-03-31 | — | — | US | disclosed |
| US-4225681-A | Graft polyesters and sized textiles | BASF WYANDOTTE CORPORATION (US) | 1980-09-30 | — | — | US | disclosed |
| EP-0010582-A2 | Graft polyester products, method of sizing yarns therewith and a synthetic fiber sized with such graft polyester products | BASF WYANDOTTE CORPORATION (US) | 1980-05-14 | — | — | EP | disclosed |
| US-3953393-A | ALKYL MERCAPTAN CHAIN TRANSFERRING AGENT | BASF WYANDOTTE CORPORATION (US) | 1976-04-27 | — | — | US | disclosed |