SCHEMBL248665

SCHEMBL248665

CCC(C)C(=O)OC(=O)C(C)CC

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SOAT1 P35610 1/20 0.39
ALDH1A1 P00352 4/20 0.36
TDP1 Q9NUW8 2/20 0.35
FFAR3 O14843 1/20 0.35
TSHR P16473 1/20 0.35
HSD17B10 Q99714 2/20 0.35
LMNA P02545 1/20 0.35
ALOX15 P16050 1/20 0.33
MGAM O43451 1/20 0.33
GAA P10253 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL614185 1.00 SOAT1 (0.39) SOAT1ALDH1A1TDP1FFAR3TSHR
SCHEMBL13955258 0.92 SOAT1 (0.35) SOAT1ALDH1A1TDP1FFAR3TSHR
SCHEMBL28196690 0.90 TSHR (0.35) SOAT1ALDH1A1TSHRHSD17B10CA1
SCHEMBL28863462 0.88 RNPEP (0.33) SOAT1TSHRGAA
SCHEMBL962928 0.87 ALDH1A1 (0.43) SOAT1ALDH1A1TDP1TSHRHSD17B10
SCHEMBL11792511 0.87 NAAA (0.37) SOAT1ALDH1A1TDP1FFAR3TSHR
SCHEMBL8332291 0.86 SOAT1 (0.41) SOAT1ALDH1A1FFAR3HSD17B10LMNA
SCHEMBL1897727 0.85 ALOX15 (0.33) SOAT1ALDH1A1HSD17B10ALOX15
SCHEMBL19821804 0.85 SOAT1 (0.39) SOAT1ALDH1A1TSHRHSD17B10LMNA
SCHEMBL1535174 0.85 SOAT1 (0.33) SOAT1ALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 496 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12215074-B2 Process for the production of peroxyesters NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2025-02-04 US claimed
US-12209065-B2 Process for the production of diacyl peroxides NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2025-01-28 US claimed
CN-119236037-A Preparation method of traditional Chinese medicine mud moxibustion ointment 美匠生物医药(广州)有限公司 2025-01-03 CN claimed
WO-2024114106-A1 SULFENTRAZONE INTERMEDIATE SYNTHESIS METHOD 宁夏格瑞精细化工有限公司 2024-06-06 WO claimed
US-11976035-B2 Process for the production of diacyl peroxides NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2024-05-07 US claimed
US-11976034-B2 Process for the production of diacyl peroxides NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2024-05-07 US claimed
CN-113993844-B Method for producing diacyl peroxide 诺力昂化学品国际有限公司 2023-10-13 CN claimed
CN-114127045-B Method for producing diacyl peroxide 诺力昂化学品国际有限公司 2023-10-13 CN claimed
CN-114008019-B Method for producing diacyl peroxide 诺力昂化学品国际有限公司 2023-09-15 CN claimed
CN-114008018-B Method for producing peroxyesters 诺力昂化学品国际有限公司 2023-09-15 CN claimed
CN-114008018-A Process for the production of peroxyesters 诺力昂化学品国际有限公司 2022-02-01 CN claimed
CN-113993844-A Process for the production of diacyl peroxides 诺力昂化学品国际有限公司 2022-01-28 CN claimed
WO-2020249688-A1 PROCESS FOR THE PRODUCTION OF DIACYL PEROXIDES NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
WO-2020249691-A1 PROCESS FOR THE PRODUCTION OF DIACYL PEROXIDES NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
WO-2020249689-A1 PROCESS FOR THE PRODUCTION OF PEROXYESTERS NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
WO-2020249690-A1 PROCESS FOR THE PRODUCTION OF DIACYL PEROXIDES NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
CN-110396387-B Heat-activated non-primary-adhesion sealant and preparation method and application thereof 宁波咖飞姆新材料有限公司 2020-03-31 CN claimed
US-20110241175-A1 HARDMASK COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE CHEIL INDUSTRIES, INC. (KR) 2011-10-06 US claimed
WO-2010071255-A1 HARDMASK COMPOSITION WITH IMPROVED STORAGE STABILITY FOR FORMING RESIST UNDERLAYER FILM CHEIL INDUSTRIES INC. (KR) 2010-06-24 WO claimed
US-6476247-B1 Processes for the preparation of organoluthenium compounds useful for thin film formation by CVD TANAKA KIKINZOKU KOGYO K.K. (JP) 2002-11-05 US claimed