SCHEMBL248666

SCHEMBL248666

CCCC(=O)OC(=O)C(C)CC

nearest known ligand 0.58

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.58
MAPT P10636 1/20 0.36
LMNA P02545 4/20 0.35
TSHR P16473 2/20 0.35
CYP3A4 P08684 1/20 0.35
ATM Q13315 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
ALOX15 P16050 1/20 0.34
FFAR3 O14843 3/20 0.33
HDAC3 O15379 3/20 0.33
HDAC1 Q13547 3/20 0.33
HDAC2 Q92769 3/20 0.33
HDAC8 Q9BY41 3/20 0.33
NAAA Q02083 1/20 0.33
DGKA P23743 1/20 0.33
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28437280 0.94 ALDH1A1 (0.58) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL28675478 0.92 ALDH1A1 (0.50) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL8332294 0.89 ALDH1A1 (0.47) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL9708581 0.88 MAPT (0.46) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL28411527 0.86 LMNA (0.53) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL28189036 0.85 ALDH1A1 (0.56) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL9122442 0.84 LMNA (0.56) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL11792511 0.84 NAAA (0.37) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL182125 0.82 ALDH1A1 (0.64) ALDH1A1MAPTLMNATSHRCYP3A4
SCHEMBL29071062 0.82 ALDH1A1 (0.46) ALDH1A1MAPTLMNATSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 506 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12215074-B2 Process for the production of peroxyesters NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2025-02-04 US claimed
US-12209065-B2 Process for the production of diacyl peroxides NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2025-01-28 US claimed
CN-119236037-A Preparation method of traditional Chinese medicine mud moxibustion ointment 美匠生物医药(广州)有限公司 2025-01-03 CN claimed
WO-2024114106-A1 SULFENTRAZONE INTERMEDIATE SYNTHESIS METHOD 宁夏格瑞精细化工有限公司 2024-06-06 WO claimed
US-11976035-B2 Process for the production of diacyl peroxides NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2024-05-07 US claimed
US-11976034-B2 Process for the production of diacyl peroxides NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2024-05-07 US claimed
CN-113993844-B Method for producing diacyl peroxide 诺力昂化学品国际有限公司 2023-10-13 CN claimed
CN-114127045-B Method for producing diacyl peroxide 诺力昂化学品国际有限公司 2023-10-13 CN claimed
CN-114008019-B Method for producing diacyl peroxide 诺力昂化学品国际有限公司 2023-09-15 CN claimed
CN-114008018-B Method for producing peroxyesters 诺力昂化学品国际有限公司 2023-09-15 CN claimed
WO-2020249688-A1 PROCESS FOR THE PRODUCTION OF DIACYL PEROXIDES NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
WO-2020249691-A1 PROCESS FOR THE PRODUCTION OF DIACYL PEROXIDES NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
WO-2020249689-A1 PROCESS FOR THE PRODUCTION OF PEROXYESTERS NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
WO-2020249690-A1 PROCESS FOR THE PRODUCTION OF DIACYL PEROXIDES NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2020-12-17 WO claimed
CN-110396387-B Heat-activated non-primary-adhesion sealant and preparation method and application thereof 宁波咖飞姆新材料有限公司 2020-03-31 CN claimed
CN-107876092-A The high stability titanium catalyst of ester exchange carbonate synthesis benzene methyl and diphenyl carbonate 华东理工大学 2018-04-06 CN claimed
CN-107417719-A A kind of titanium chelate catalyst for being used for carbonate synthesis benzene methyl and diphenyl carbonate 华东理工大学 2017-12-01 CN claimed
US-20110241175-A1 HARDMASK COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE CHEIL INDUSTRIES, INC. (KR) 2011-10-06 US claimed
WO-2010071255-A1 HARDMASK COMPOSITION WITH IMPROVED STORAGE STABILITY FOR FORMING RESIST UNDERLAYER FILM CHEIL INDUSTRIES INC. (KR) 2010-06-24 WO claimed
US-6476247-B1 Processes for the preparation of organoluthenium compounds useful for thin film formation by CVD TANAKA KIKINZOKU KOGYO K.K. (JP) 2002-11-05 US claimed