SCHEMBL2487943

SCHEMBL2487943

O=C1OC(=O)OC2=C(CCCC2)O1

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TRIM24 O15164 2/20 0.37
TRIM33 Q9UPN9 2/20 0.37
TSHR P16473 1/20 0.35
ALDH1A1 P00352 1/20 0.35
CA1 P00915 1/20 0.33
CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10693482 0.94 TRIM24 (0.33) TRIM24TRIM33TSHRALDH1A1CA1
SCHEMBL2955886 0.94 TSHR (0.35) TRIM24TRIM33TSHR
SCHEMBL8653782 0.87 TSHR (0.39) TSHRALDH1A1
Cyclohexane SCHEMBL4940109 0.75 TRIM24 (0.38) TRIM24TRIM33TSHRALDH1A1
SCHEMBL2822859 0.75
SCHEMBL30151463 0.72
SCHEMBL6230246 0.72
SCHEMBL51257 0.72 ALDH1A1 (0.35) TRIM24TRIM33TSHRALDH1A1
SCHEMBL52082 0.72 ALDH1A1 (0.35) TRIM24TRIM33TSHRALDH1A1
SCHEMBL51904 0.72 ALDH1A1 (0.35) TRIM24TRIM33TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2305402-B1 METHOD FOR PRODUCING SILVER-CONTAINING POWDER AND CONDUCTIVE PASTE USING THE SAME DAINIPPON INK & CHEMICALS (JP) 2017-11-29 EP claimed
EP-2267054-B1 Polyester synthesis XEROX CORP (US) 2012-08-22 EP claimed
EP-0686167-B1 COPOLYMERIZATION OF TETRAHYDROFURANS AND CYCLIC ANHYDRIDES DU PONT (US) 1998-07-08 EP claimed
EP-0377357-B1 Process for the condensation of at least one epoxide on at least one cyclic anhyhride in the presence of a titanium-based catalyst INST FRANCAIS DU PETROLE (FR) 1994-03-23 EP claimed
EP-0387119-B1 Process for the condensation of at least one epoxide with at least one cyclic anhydride in the presence of a catalyst based on at least one nitrogen containing titanium complex INST FRANCAIS DU PETROLE (FR) 1993-11-18 EP claimed
EP-3174845-B1 METHOD FOR THE PROCESSING OF A RAW ESTER CONTAINING THE ESTERIFICATION CATALYST HYDROLYSIS PRODUCT IN SUSPENDED PARTICULATE FORM BASF SE (DE) 2020-04-29 EP disclosed
EP-1363868-B1 METHOD FOR PRODUCING CYCLOHEXANE DICARBOXYLIC ACIDS AND THE DERIVATIVES THEREOF BASF SE (DE) 2017-11-01 EP disclosed
EP-3174845-A1 PROCESS FOR WORKUP OF A CRUDE ESTER COMPRISING ESTERIFICATION CATALYST HYDROLYSIS PRODUCT IN SUSPENDED PARTICULATE FORM BASF SE (DE) 2017-06-07 EP disclosed
WO-2016016285-A1 PROCESS FOR WORKUP OF A CRUDE ESTER COMPRISING ESTERIFICATION CATALYST HYDROLYSIS PRODUCT IN SUSPENDED PARTICULATE FORM BASF SE (DE) 2016-02-04 WO disclosed
EP-2379482-B1 PRODUCTION OF CARBOXYLIC ACID ESTERS BY STRIPPING WITH ALCOHOL VAPOR BASF SE (DE) 2015-08-26 EP disclosed
EP-2379481-B1 METHOD FOR PRODUCING CARBOXYLIC ACID ESTERS BASF SE (DE) 2015-08-26 EP disclosed
EP-2379483-B1 METHOD FOR REGENERATION OF A RAW ESTER BASF SE (DE) 2013-06-26 EP disclosed
EP-0320677-A1 N-phenyl tetrahydrophthalimide derivatives BASF Aktiengesellschaft (DE) 1989-06-21 EP disclosed
EP-0288789-A1 N-arylpyrroline-2,5-diones BAYER AG (DE) 1988-11-02 EP disclosed
EP-0272550-A2 Light-sensitive registration material with a light-sensitive intermediate layer HOECHST AKTIENGESELLSCHAFT (DE) 1988-06-29 EP disclosed
EP-0113314-B1 COMPOSITIONS PHOTOCURABLE IN THE PRESENCE OF SENSITIZERS CIBA-GEIGY AG (CH) 1988-05-18 EP disclosed
EP-0226201-A2 Light-sensitive printing plate for dry lithography HOECHST AKTIENGESELLSCHAFT (DE) 1987-06-24 EP disclosed
EP-0211391-A2 Light-sensitive mixture and registration material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1987-02-25 EP disclosed
EP-0152819-A1 Light-sensitive mixture with diazoresins and light-sensitive registration material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1985-08-28 EP disclosed
EP-0113314-A1 Compositions photocurable in the presence of sensitizers CIBA-GEIGY AG (CH) 1984-07-11 EP disclosed