Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRIM24 | O15164 | 2/20 | 0.38 |
| ▸ | TRIM33 | Q9UPN9 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cyclohexane SCHEMBL10358872 | 0.86 | CA1 (0.33) | TRIM24TRIM33TSHRALDH1A1 | |
| Bicarbonate SCHEMBL3784747 | 0.86 | CA1 (0.33) | TRIM24TRIM33TSHRALDH1A1 | |
| Cyclopentane SCHEMBL525206 | 0.86 | CA1 (0.33) | TRIM24TRIM33TSHRALDH1A1 | |
| Cyclooctane SCHEMBL9815451 | 0.86 | CA1 (0.33) | TRIM24TRIM33TSHRALDH1A1 | |
| SCHEMBL262924 | 0.85 | TSHR (0.36) | TSHR | |
| SCHEMBL11129218 | 0.80 | — | — | |
| SCHEMBL2793863 | 0.76 | KMT2A (0.46) | — | |
| SCHEMBL19610854 | 0.75 | CA1 (0.46) | TSHRALDH1A1 | |
| SCHEMBL2487943 | 0.75 | TRIM24 (0.37) | TRIM24TRIM33TSHRALDH1A1 | |
| SCHEMBL2955886 | 0.75 | TSHR (0.35) | TRIM24TRIM33TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1780599-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION | FUJIFILM Corporation (JP) | 2007-05-02 | — | — | EP | disclosed |
| WO-2005109098-A1 | PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-11-17 | — | — | WO | disclosed |
| WO-2005091078-A1 | PATTERN FORMING PROCESS AND PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005083522-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-09 | — | — | WO | disclosed |
| WO-2005078776-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-25 | — | — | WO | disclosed |