2-Pyrrolidone

2-Pyrrolidone

SCHEMBL2489556

C=CC(N)=O.O=C1CCCN1

nearest known ligand 0.60

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
OR51E2 Q9H255 1/20 0.60
CRBN Q96SW2 3/20 0.52
FKBP5 Q13451 1/20 0.52
ALDH1A1 P00352 1/20 0.44
TSHR P16473 1/20 0.44
FGFR4 P22455 1/20 0.44
KDM4E B2RXH2 2/20 0.38
GAA P10253 1/20 0.38
POLB P06746 1/20 0.38
NNMT P40261 1/20 0.33
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
2-Pyrrolidone SCHEMBL29089087 0.93 OR51E2 (0.52) OR51E2CRBNFKBP5ALDH1A1TSHR
Caprolactam SCHEMBL1415360 0.92 CRBN (0.59) OR51E2CRBNFKBP5ALDH1A1TSHR
2-Pyrrolidone SCHEMBL7161774 0.90 OR51E2 (0.48) OR51E2CRBNFKBP5ALDH1A1TSHR
2-Pyrrolidone SCHEMBL4193115 0.86 OR51E2 (0.62) OR51E2CRBNFKBP5KDM4EGAA
2-Pyrrolidone SCHEMBL11253981 0.86 OR51E2 (0.62) OR51E2CRBNFKBP5KDM4EGAA
2-Pyrrolidone SCHEMBL28310048 0.85 OR51E2 (0.68) OR51E2CRBNFKBP5KDM4EGAA
2-Pyrrolidone SCHEMBL6849688 0.85 OR51E2 (0.75) OR51E2CRBNFKBP5ALDH1A1KDM4E
2-Pyrrolidone SCHEMBL4666153 0.83 OR51E2 (0.71) OR51E2CRBNFKBP5TSHRKDM4E
2-Pyrrolidone SCHEMBL6535468 0.83
2-Pyrrolidone SCHEMBL622496 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116875271-A Amphiphilic self-healing type organic silicon pouring sealant and preparation method thereof 东至绿洲环保化工有限公司 2023-10-13 CN claimed
CN-116875271-A Amphiphilic self-healing type organic silicon pouring sealant and preparation method thereof 东至绿洲环保化工有限公司 2023-10-13 CN disclosed
CN-116875271-A Amphiphilic self-healing type organic silicon pouring sealant and preparation method thereof 东至绿洲环保化工有限公司 2023-10-13 CN disclosed
CN-105209049-B Antimicrobial compositions and its manufacturing method 医学科技研究公司 2019-05-14 CN disclosed
CN-108289911-A Composition 希格默伊德药业有限公司 2018-07-17 CN disclosed
CN-102050926-B Heat-resistant salt-tolerate graft polyacrylamide and preparation method thereof CHINA PETROLEUM & CHEMICAL 2012-08-29 CN disclosed
EP-2376055-A1 COSMETIC COMPOSITION CONTAINING A LOCUST BEAN GUM HYDROLYSATE Pierre Fabre Dermo-Cosmétique (FR) 2011-10-19 EP disclosed
CN-102050926-A Heat-resistant salt-tolerate graft polyacrylamide and preparation method thereof CHINA PETROLEUM & CHEMICAL 2011-05-11 CN disclosed
CN-101802128-A Improving one's methods of tertiary oil recovery SNF SAS 2010-08-11 CN disclosed
CN-1519259-A Method for synthetizing anion type and non-ion type dispersoid for water-soluble polymer 王丕新 2004-08-11 CN disclosed
EP-1317510-A2 A METHOD OF TOUGHENING THERMOPLASTIC POLYMERS AND THERMOPLASTIC COMPOSITIONS PRODUCED THEREBY Rohm and Haas Company (US) 2003-06-11 EP disclosed
EP-1317509-A2 A METHOD OF IMPROVING THE MELT PROCESSING OF THERMOPLASTIC POLYMERS AND COMPOSITIONS PRODUCED THEREBY Rohm and Haas Company (US) 2003-06-11 EP disclosed
WO-2002022716-A2 A METHOD OF TOUGHENING THERMOPLASTIC POLYMERS AND THERMOPLASTIC COMPOSITIONS PRODUCED THEREBY ROHM AND HAAS COMPANY (US) 2002-03-21 WO disclosed
WO-2002022715-A2 A METHOD OF IMPROVING THE MELT PROCESSING OF THERMOPLASTIC POLYMERS AND COMPOSITIONS PRODUCED THEREBY ROHM AND HAAS COMPANY (US) 2002-03-21 WO disclosed
EP-1063972-A1 POLYMER BASED RAPIDLY DISSOLVING TABLETS AND PRODUCTION PROCESSES THEREOF Yamanouchi Shaklee Pharma (US) 2001-01-03 EP disclosed
WO-1999047126-A1 POLYMER BASED RAPIDLY DISSOLVING TABLETS AND PRODUCTION PROCESSES THEREOF YAMANOUCHI SHAKLEE PHARMA (US) 1999-09-23 WO disclosed
US-5591558-A DEVELOPING ELECTROSTATIC LATENT IMAGE ON PHOTORECEPTOR;WEAR RESISTANCE, DURABILITY; ELECTROGRAPHY KONICA CORPORATION (JP) 1997-01-07 US disclosed
EP-0123904-B2 HEAT DEVELOPABLE PHOTOGRAPHIC MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1993-02-03 EP disclosed
US-4783392-A Method for forming an dye transfer image with oil in separating layer FUJI PHOTO FILM CO., LTD. (JP) 1988-11-08 US disclosed
EP-0123904-B1 HEAT DEVELOPABLE PHOTOGRAPHIC MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1987-06-24 EP disclosed