SCHEMBL24901042

SCHEMBL24901042

O=C(OCc1cccc(Cl)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.52
MMP1 P03956 1/20 0.49
MMP2 P08253 1/20 0.49
MMP9 P14780 1/20 0.49
MMP12 P39900 1/20 0.49
ALDH1A1 P00352 2/20 0.48
KDM4E B2RXH2 1/20 0.48
TSHR P16473 1/20 0.48
MAOB P27338 4/20 0.48
MAOA P21397 3/20 0.48
CYP3A4 P08684 2/20 0.46
IDO1 P14902 2/20 0.46
AGXT P21549 2/20 0.46
RXRA P19793 1/20 0.46
RXRB P28702 1/20 0.46
RXRG P48443 1/20 0.46
NR4A2 P43354 1/20 0.45
HTT P42858 1/20 0.43
HPGD P15428 1/20 0.43
LMNA P02545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24142281 0.84 HCAR2 (0.54) HCAR2MMP1MMP2MMP9MMP12
SCHEMBL26163195 0.82 MAOB (0.49) MMP2MMP9MMP12MAOBMAOA
SCHEMBL24177998 0.82 IDO1 (0.46) HCAR2MMP1MMP12MAOBIDO1
SCHEMBL24142273 0.82 PRKCA (0.59) MMP1MMP12MAOBIDO1NR4A2
SCHEMBL24142323 0.81 MAOA (0.43) MMP1MMP2MMP9MMP12ALDH1A1
SCHEMBL24142683 0.81 KMT2A (0.56) HCAR2ALDH1A1LMNAKMT2A
SCHEMBL13450058 0.80 HCAR2 (0.56) HCAR2MMP1MMP2MMP9MMP12
SCHEMBL24901094 0.80 MRGPRX4 (0.47) MMP2MMP9MAOBMRGPRX4
SCHEMBL24901135 0.79 FFAR4 (0.45) HCAR2MMP1MMP12TSHRMAOB
SCHEMBL15784556 0.79 PRKCA (0.38) HCAR2MMP1MMP12ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR HCAR2 2416/4885MMP1 4189/4885MMP2 4588/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.