SCHEMBL24901094

SCHEMBL24901094

O=C(OCc1cccc(OC(F)(F)F)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MRGPRX4 Q96LA9 2/20 0.47
MAPK14 Q16539 1/20 0.45
MMP2 P08253 1/20 0.45
MMP9 P14780 1/20 0.45
MMP14 P50281 1/20 0.45
ADAM17 P78536 1/20 0.45
FFAR4 Q5NUL3 1/20 0.44
CETP P11597 3/20 0.44
CYP19A1 P11511 1/20 0.43
CYP11B1 P15538 1/20 0.43
CYP11B2 P19099 1/20 0.43
CHRM2 P08172 1/20 0.43
CHRM1 P11229 1/20 0.43
CHRM3 P20309 1/20 0.43
CNR1 P21554 1/20 0.43
ROCK2 O75116 1/20 0.43
ROCK1 Q13464 1/20 0.43
DAO P14920 1/20 0.42
KDM5A P29375 1/20 0.42
KDM4C Q9H3R0 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26163958 0.84 MEN1 (0.39) MRGPRX4MAPK14MMP2MMP9FFAR4
SCHEMBL24901093 0.82 L3MBTL1 (0.43) MRGPRX4MMP2MMP9MMP14ADAM17
SCHEMBL28144609 0.81 ALDH1A1 (0.53) MRGPRX4MAPK14MMP2MMP9MMP14
SCHEMBL29103739 0.81 ALDH1A1 (0.53) MRGPRX4MAPK14MMP2MMP9MMP14
SCHEMBL24142281 0.81 HCAR2 (0.54) MMP2MMP9MAOB
SCHEMBL24142273 0.80 PRKCA (0.59) MRGPRX4FFAR4MAOB
SCHEMBL26163195 0.80 MAOB (0.49) MMP2MMP9FFAR4MAOB
SCHEMBL24177998 0.80 IDO1 (0.46) MAOB
SCHEMBL24901042 0.80 HCAR2 (0.52) MRGPRX4MMP2MMP9MAOB
SCHEMBL24142683 0.79 KMT2A (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR MRGPRX4 2069/4885MAPK14 2016/4885MMP2 4588/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.