SCHEMBL24901093

SCHEMBL24901093

O=C(OCc1ccc(OC(F)(F)F)cc1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.43
EPHX2 P34913 2/20 0.42
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
MMP14 P50281 1/20 0.42
ADAM17 P78536 1/20 0.42
NLRP3 Q96P20 1/20 0.42
MRGPRX4 Q96LA9 2/20 0.42
MMP12 P39900 1/20 0.41
EPHX1 P07099 2/20 0.41
NR1H4 Q96RI1 1/20 0.41
GPR84 Q9NQS5 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
POLB P06746 1/20 0.40
MAPK8 P45983 1/20 0.40
CYP19A1 P11511 1/20 0.40
CYP11B1 P15538 1/20 0.40
CYP11B2 P19099 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24901094 0.82 MRGPRX4 (0.47) MMP2MMP9MMP14ADAM17MRGPRX4
SCHEMBL24177943 0.82 KMT2A (0.44) L3MBTL1MMP1MMP2MMP9MMP12
SCHEMBL26163160 0.81 MAOB (0.44) MMP1MMP2MMP9MMP12CA1
SCHEMBL26163158 0.81 KMT2A (0.46) MMP1CA1CA2
SCHEMBL24142323 0.81 MAOA (0.43) L3MBTL1MMP1MMP2MMP9MMP12
SCHEMBL24142317 0.81 CA1 (0.43) CA1CA2
SCHEMBL24142275 0.81 MAOB (0.50) MMP1MMP12CA1CA2
SCHEMBL24142683 0.80 KMT2A (0.56) L3MBTL1POLB
SCHEMBL24142267 0.80 PPARG (0.45) CA1CA2
SCHEMBL2056283 0.79 ALDH1A1 (0.55) EPHX2MMP1MMP2MMP9MMP14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR L3MBTL1 2700/4885EPHX2 4060/4885MMP1 4189/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.