SCHEMBL24901131

SCHEMBL24901131

O=C(OCc1ccc(F)c(F)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.48
MAOB P27338 1/20 0.48
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
RIPK1 Q13546 1/20 0.38
TP53 P04637 2/20 0.37
THRB P10828 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
ALDH1A1 P00352 1/20 0.36
PPARA Q07869 1/20 0.36
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36
LMNA P02545 1/20 0.35
GRM2 Q14416 1/20 0.35
GRM3 Q14832 1/20 0.35
KDM5A P29375 1/20 0.35
KDM4C Q9H3R0 1/20 0.35
KDM5B Q9UGL1 1/20 0.35
PTPRC P08575 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24177943 0.82 KMT2A (0.44) MAOBCA1CA2MEN1KMT2A
SCHEMBL24142323 0.81 MAOA (0.43) MAOAMAOBCA1CA2MEN1
SCHEMBL13811550 0.81 MAOB (0.54) MAOAMAOBRIPK1TP53THRB
SCHEMBL24142281 0.80 HCAR2 (0.54) MAOAMAOBMEN1KMT2A
SCHEMBL24142227 0.79 SLC1A3 (0.44) MEN1KMT2APTPRCPTPN1MRGPRX4
SCHEMBL24901042 0.79 HCAR2 (0.52) MAOAMAOBKMT2AALDH1A1LMNA
SCHEMBL24901134 0.79 MMP2 (0.42) MAOBCA1CA2MEN1KMT2A
SCHEMBL24142317 0.78 CA1 (0.43) CA1CA2MEN1KMT2AALDH1A1
SCHEMBL24142275 0.78 MAOB (0.50) MAOBCA1CA2MEN1KMT2A
SCHEMBL24901418 0.78 MMP2 (0.43) MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR MAOA 4592/4885MAOB 4452/4885CA1 1590/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.