SCHEMBL24901407

SCHEMBL24901407

OC(c1cccc(C(F)(F)F)c1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.50
MAPK1 P28482 2/20 0.50
CES2 O00748 1/20 0.50
MGLL Q99685 1/20 0.50
AR P10275 1/20 0.47
MEN1 O00255 2/20 0.46
MAPT P10636 2/20 0.46
KMT2A Q03164 2/20 0.46
HTT P42858 1/20 0.46
RAB9A P51151 1/20 0.46
HTR3E A5X5Y0 1/20 0.46
HTR3B O95264 1/20 0.46
HTR3A P46098 1/20 0.46
HTR3D Q70Z44 1/20 0.46
HTR3C Q8WXA8 1/20 0.46
ALDH1A1 P00352 3/20 0.44
NR1H3 Q13133 2/20 0.44
NR1H2 P55055 1/20 0.44
P2RX1 P51575 1/20 0.43
GAA P10253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29509593 1.00 TSHR (0.50) TSHRMAPK1CES2MGLLAR
SCHEMBL832913 0.93 NR1H3 (0.47) TSHRMAPK1ARMEN1KMT2A
SCHEMBL24436844 0.85 NR1H3 (0.44) TSHRMAPK1ARMEN1KMT2A
SCHEMBL19734501 0.83 ACHE (0.50) TSHRMAPK1ARMEN1KMT2A
SCHEMBL62723 0.83 TSHR (0.67) TSHRMAPK1CES2MGLLMAPT
SCHEMBL12441430 0.82 PTPN1 (0.48) TSHRMAPK1ARMEN1KMT2A
SCHEMBL25489557 0.81 TSHR (0.54) TSHRMAPK1CES2MGLLMEN1
SCHEMBL22932515 0.81 TSHR (0.54) TSHRMAPK1CES2MGLLMEN1
SCHEMBL6317752 0.81 TSHR (0.54) TSHRMAPK1CES2MGLLMEN1
SCHEMBL26548517 0.81 NR1H3 (0.44) TSHRMAPK1ARMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR TSHR 2477/4885MAPK1 3446/4885CES2 1660/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.