SCHEMBL24908657

SCHEMBL24908657

CCC1(OC(=O)COc2ccc(C)cc2)CCCC1

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.49
GAA P10253 2/20 0.49
L3MBTL1 Q9Y468 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
NPC1 O15118 1/20 0.47
MAPT P10636 1/20 0.43
HPGD P15428 1/20 0.43
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
TSHR P16473 1/20 0.42
NPSR1 Q6W5P4 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
WDR5 P61964 1/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
TRPM8 Q7Z2W7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13131021 0.86 MEN1 (0.40) LMNAGAAMAPTHPGDKMT2A
SCHEMBL16406603 0.84 LMNA (0.50) LMNAGAAL3MBTL1MAPTHPGD
SCHEMBL6368470 0.83 ALDH1A1 (0.57) LMNAL3MBTL1TDP1NPC1MAPT
SCHEMBL14838451 0.82 CYP1A2 (0.37) LMNAGAAHPGDKMT2AMEN1
SCHEMBL25818152 0.82 MEN1 (0.37) LMNAGAAHPGDKMT2AMEN1
SCHEMBL13137719 0.82 ALDH1A1 (0.56) LMNAL3MBTL1TDP1NPC1MAPT
SCHEMBL9924199 0.82 MEN1 (0.40) LMNANPC1MAPTHPGDKMT2A
SCHEMBL26797547 0.82 MAPT (0.42) LMNAGAANPC1MAPTKMT2A
SCHEMBL11990083 0.81 MEN1 (0.39) GAANPC1MAPTHPGDKMT2A
SCHEMBL16406662 0.80 MEN1 (0.53) LMNAGAANPC1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023002869-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN 富士フイルム株式会社 2023-01-26 WO disclosed