Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | THRB | P10828 | 3/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | ATF4 | P18848 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25818154 | 0.85 | CYP19A1 (0.44) | KDM4EALDH1A1HPGDLMNATHRB | |
| SCHEMBL24908657 | 0.82 | LMNA (0.49) | MEN1KMT2ATSHRHPGDLMNA | |
| SCHEMBL13131021 | 0.80 | MEN1 (0.40) | MEN1KMT2ATSHRKDM4EALDH1A1 | |
| SCHEMBL26079339 | 0.78 | SMN1; SMN2 (0.34) | MEN1KMT2ATSHRKDM4EALDH1A1 | |
| SCHEMBL13137719 | 0.78 | ALDH1A1 (0.56) | MEN1KMT2ATSHRALDH1A1LMNA | |
| SCHEMBL14838451 | 0.78 | CYP1A2 (0.37) | MEN1KMT2ATSHRKDM4EALDH1A1 | |
| SCHEMBL11990083 | 0.77 | MEN1 (0.39) | MEN1KMT2ATSHRKDM4EALDH1A1 | |
| SCHEMBL26079341 | 0.77 | SMN1; SMN2 (0.35) | MEN1KMT2ATSHRKDM4EALDH1A1 | |
| SCHEMBL6368470 | 0.77 | ALDH1A1 (0.57) | MEN1KMT2ATSHRALDH1A1LMNA | |
| SCHEMBL14787955 | 0.76 | ELANE (0.38) | MEN1KMT2ATSHRKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |