SCHEMBL24908759

SCHEMBL24908759

Oc1ccc(C(O)C(c2ccc(F)cc2)c2ccc(F)cc2)cc1F

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.46
GRIN2B Q13224 3/20 0.41
GRIN1 Q05586 1/20 0.41
TDP1 Q9NUW8 5/20 0.39
RECQL P46063 4/20 0.39
KDM4E B2RXH2 4/20 0.39
MAPT P10636 3/20 0.39
LMNA P02545 3/20 0.39
BLM P54132 2/20 0.39
ALOX15 P16050 1/20 0.39
TSHR P16473 1/20 0.39
NFKB1 P19838 1/20 0.39
THPO P40225 1/20 0.39
HIF1A Q16665 1/20 0.39
HSD17B10 Q99714 1/20 0.39
POLB P06746 1/20 0.39
APEX1 P27695 1/20 0.39
MTOR P42345 1/20 0.39
KMT2A Q03164 1/20 0.39
CA3 P07451 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25121951 0.80 SHBG (0.49) SHBGGRIN2BGRIN1KDM4ELMNA
SCHEMBL29948072 0.80 SHBG (0.49) SHBGGRIN2BGRIN1KDM4ELMNA
SCHEMBL835607 0.80 SHBG (0.49) SHBGGRIN2BGRIN1KDM4ELMNA
SCHEMBL30343458 0.79 SHBG (0.55) SHBGGRIN2BKDM4ELMNAHIF1A
SCHEMBL1597362 0.79 SHBG (0.55) SHBGGRIN2BKDM4ELMNAHIF1A
SCHEMBL10895963 0.78 SHBG (0.51) SHBGTDP1RECQLKDM4EMAPT
SCHEMBL27739784 0.77 SHBG (0.50) SHBGGRIN2BGRIN1TDP1RECQL
SCHEMBL4471795 0.74 SHBG (0.55) SHBGGRIN2BKDM4ELMNAHIF1A
SCHEMBL27337905 0.74 SHBG (0.50) SHBGGRIN2BTDP1RECQLKDM4E
SCHEMBL27677106 0.73 CYP17A1 (0.60) SHBGGRIN2BGRIN1TDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023002869-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN 富士フイルム株式会社 2023-01-26 WO disclosed