Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.49 |
| ▸ | CA3 | P07451 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA5A | P35218 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.41 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.40 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 2/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.39 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | HSD17B1 | P14061 | 3/20 | 0.36 |
| ▸ | HSD17B2 | P37059 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.34 |
| ▸ | TDO2 | P48775 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29948072 | 1.00 | SHBG (0.49) | SHBGCA3CA6CA5ACA9 | |
| SCHEMBL25121951 | 1.00 | SHBG (0.49) | SHBGCA3CA6CA5ACA9 | |
| SCHEMBL1596219 | 0.94 | SHBG (0.53) | SHBGCA3CA6CA5ACA9 | |
| SCHEMBL4471795 | 0.91 | SHBG (0.55) | SHBGCA3CA6CA5ACA9 | |
| SCHEMBL29948191 | 0.86 | SHBG (0.47) | SHBGGRIN2BGRIN1ESR1ESR2 | |
| SCHEMBL27620448 | 0.86 | SHBG (0.47) | SHBGGRIN2BGRIN1ESR1ESR2 | |
| SCHEMBL833877 | 0.86 | SHBG (0.47) | SHBGGRIN2BGRIN1ESR1ESR2 | |
| SCHEMBL834372 | 0.81 | RPS6KA3 (0.39) | SHBGCA3CA6CA5ACA9 | |
| SCHEMBL27739784 | 0.80 | SHBG (0.50) | SHBGCA3CA6CA5ACA9 | |
| SCHEMBL24908759 | 0.80 | SHBG (0.46) | SHBGCA3CA6CA5ACA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 161 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3904079-B1 | GAS BARRIER LAMINATE | LINTEC CORP (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-20240101859-A1 | RESIN COMPOSITION FOR COATING, POLYMER, METHOD FOR PRODUCING POLYMER, COATING FILM, AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| US-20240092967-A1 | RESIN COMPOSITION FOR COATING, POLYMER, METHOD FOR PRODUCING POLYMER, COATING FILM, AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2024-03-21 | — | — | US | disclosed |
| EP-4339251-A1 | COATING RESIN COMPOSITION, POLYMER, POLYMER PRODUCTION METHOD, COATING FILM AND PRODUCTION METHOD THEREFOR | FUJIFILM Corporation (JP) | 2024-03-20 | — | — | EP | disclosed |
| EP-4339252-A1 | RESIN COMPOSITION FOR COATING, POLYMER, METHOD FOR PRODUCING POLYMER, COATING FILM AND METHOD FOR PRODUCING SAME | FUJIFILM Corporation (JP) | 2024-03-20 | — | — | EP | disclosed |
| CN-117242145-A | Resin composition for coating, polymer, method for producing polymer, coating film, and method for producing coating film | 富士胶片株式会社 | 2023-12-15 | — | — | CN | disclosed |
| CN-117203294-A | Resin composition for coating, polymer, method for producing polymer, coating film, and method for producing coating film | 富士胶片株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-117062716-A | Laminate body | 琳得科株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-116890497-A | Laminate, transparent conductive film, and method for producing transparent conductive film | 琳得科株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-113226746-B | Gas barrier laminate | 琳得科株式会社 | 2023-08-11 | — | — | CN | disclosed |
| EP-0852342-B1 | Coating liquid composition for photosensitive member for electrophotography and method of manufacturing photosensitive member for elelctrophotography using same | SHARP KK (JP) | 2002-02-27 | — | — | EP | disclosed |
| US-20020012871-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
| EP-0979854-A1 | CIRCUIT CONNECTING MATERIAL, AND STRUCTURE AND METHOD OF CONNECTING CIRCUIT TERMINAL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-02-16 | — | — | EP | disclosed |
| US-5902872-A | POLYARYLATE COMPRISING 2,2-BIS/3-METHYL-4-HYDROXYPHENYL/PROPANE UNITS, TEREPHTHALIC ACID UNITS AND ISOPHTHALIC ACID UNITS, HAVING SPECIFIED INHERENT VISCOSITY | UNITIKA, LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| EP-0884342-A1 | Resin for coating formation and method for producing the same | UNITIKA LTD. (JP) | 1998-12-16 | — | — | EP | disclosed |