SCHEMBL24908768

SCHEMBL24908768

O=C(OC[C@@H]1CC2CC3CC(C2)CC1C3)C(F)(F)S(=O)(=O)O

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL686988 0.88 SCN9A (0.36) ALDH1A1L3MBTL1
SCHEMBL14390068 0.88 SCN9A (0.36) ALDH1A1L3MBTL1
SCHEMBL20860455 0.86
SCHEMBL686458 0.86 HSD11B1 (0.37) ALDH1A1L3MBTL1
SCHEMBL2605948 0.82 ALDH1A1 (0.31) ALDH1A1L3MBTL1
SCHEMBL10151016 0.82 CYP1A2 (0.31)
SCHEMBL2605947 0.81 ALDH1A1 (0.30) ALDH1A1L3MBTL1
SCHEMBL13425018 0.80
SCHEMBL686484 0.80 TDP1 (0.35) ALDH1A1L3MBTL1
SCHEMBL4403791 0.80 ALDH1A1 (0.35) ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023002869-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN 富士フイルム株式会社 2023-01-26 WO disclosed