Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | DRD2 | P14416 | 3/20 | 0.34 |
| ▸ | PDE4A | P27815 | 3/20 | 0.34 |
| ▸ | PDE4C | Q08493 | 3/20 | 0.34 |
| ▸ | PDE4D | Q08499 | 3/20 | 0.34 |
| ▸ | DRD1 | P21728 | 1/20 | 0.34 |
| ▸ | DRD4 | P21917 | 1/20 | 0.34 |
| ▸ | DRD5 | P21918 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.34 |
| ▸ | CETP | P11597 | 1/20 | 0.33 |
| ▸ | ELANE | P08246 | 2/20 | 0.33 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.33 |
| ▸ | CTSS | P25774 | 1/20 | 0.33 |
| ▸ | CTSK | P43235 | 1/20 | 0.33 |
| ▸ | CTSG | P08311 | 1/20 | 0.33 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.32 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.32 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5559026 | 0.80 | ATM (0.43) | ATMGAADRD2DRD1DRD4 | |
| SCHEMBL29414133 | 0.80 | ATM (0.43) | ATMGAADRD2DRD1DRD4 | |
| SCHEMBL6764165 | 0.79 | MAPT (0.43) | DRD2PDE4APDE4CPDE4DDRD1 | |
| SCHEMBL6759609 | 0.77 | ADORA2A (0.38) | DRD2PDE4APDE4CPDE4DDRD1 | |
| Hydrogen Sulfide SCHEMBL27733891 | 0.77 | MAPT (0.42) | DRD2PDE4APDE4CPDE4DDRD1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3867909 | 0.75 | ELANE (0.34) | ELANECTSG | |
| SCHEMBL2498662 | 0.75 | ADORA2A (0.37) | DRD2PDE4APDE4CPDE4DDRD1 | |
| SCHEMBL10062806 | 0.75 | DRD2 (0.42) | DRD2PDE4APDE4CPDE4DDRD1 | |
| SCHEMBL7448851 | 0.74 | GAA (0.51) | ATMGAACETPFFAR4CXCR2 | |
| Biphenyl SCHEMBL113983 | 0.72 | CXCR2 (0.43) | CXCR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8029970-B2 | Composition for manufacturing barrier rib, and plasma display panel manufactured by the same | SAMSUNG SDI CO., LTD. (KR) | 2011-10-04 | — | — | US | claimed |
| US-20080290314-A1 | COMPOSITION FOR MANUFACTURING BARRIER RIB, AND PLASMA DISPLAY PANEL MANUFACTURED BY THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2008-11-27 | — | — | US | claimed |
| US-7442488-B2 | Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode | SAMSUNG SDI CO., LTD. (KR) | 2008-10-28 | — | — | US | claimed |
| US-20060073412-A1 | Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode | SAMSUNG SDI CO., LTD. (KR) | 2006-04-06 | — | — | US | claimed |
| US-6749990-B2 | UNSATURATED HALOGENATED HYDROCARBON AS PHOTORESIST MONOMER, FOR EXAMPLE 3,3,4,4,5,5,6,6,6-NONAFLUORO-1-HEXENE; ETCHING RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-06-15 | — | — | US | claimed |
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | claimed |
| CN-114131923-B | Method for producing polyurethane three-dimensional objects from materials having multiple hardening mechanisms | 卡本有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-115195104-B | Dual precursor resin system for additive manufacturing with dual cure resins | 卡本有限公司 | 2023-12-05 | — | — | CN | disclosed |
| CN-112867601-B | Method for producing spatially varying dielectric materials, articles produced by the method and use thereof | 罗杰斯公司 | 2023-11-17 | — | — | CN | disclosed |
| CN-108139665-B | Dual precursor resin system for additive manufacturing with dual cure resins | 卡本有限公司 | 2022-07-05 | — | — | CN | disclosed |
| CN-114131923-A | Method for producing three-dimensional objects of polyurethane from materials with multiple hardening mechanisms | 卡本有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-109153173-B | Three-dimensional printing method and apparatus for reducing bubbles by building panel degassing | 卡本有限公司 | 2021-08-24 | — | — | CN | disclosed |
| CN-113126432-A | Coating composition for photoresist underlayer | 罗门哈斯电子材料韩国有限公司 | 2021-07-16 | — | — | CN | disclosed |
| US-20060073412-A1 | Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode | SAMSUNG SDI CO., LTD. (KR) | 2006-04-06 | — | — | US | disclosed |
| US-6749990-B2 | UNSATURATED HALOGENATED HYDROCARBON AS PHOTORESIST MONOMER, FOR EXAMPLE 3,3,4,4,5,5,6,6,6-NONAFLUORO-1-HEXENE; ETCHING RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-06-15 | — | — | US | disclosed |
| US-6720129-B2 | PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS | HYNIX SEMICONDUCTOR INC (KR) | 2004-04-13 | — | — | US | disclosed |
| US-6699951-B2 | POLLUTION CONTROL, STORAGE STABILITY AND HIGH SENSITIVITY | SAMSUNG SDI CO., LTD. (KR) | 2004-03-02 | — | — | US | disclosed |
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | disclosed |
| US-20020164541-A1 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR, INC. (KR) | 2002-11-07 | — | — | US | disclosed |
| US-20020143130-A1 | Monomer and polymer for photoresist, photoresist composition, and phosphor layer composition for color cathode ray tube | SAMSUNG SDI CO., LTD. (KR) | 2002-10-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | ETV6, UFM1, UTS2R | ATM 2736/4885GAA 3802/4885DRD2 2771/4885 |
| US-20020143130-A1 | Monomer and polymer for photoresist, photoresist composition, and phosphor layer composition for color cathode ray tube | SCO2, CCT4, TCP1 | ATM 2198/4885GAA 4864/4885DRD2 2327/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.