Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | USP2 | O75604 | 1/20 | 0.43 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | FABP3 | P05413 | 1/20 | 0.40 |
| ▸ | FABP4 | P15090 | 1/20 | 0.40 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.40 |
| ▸ | DRD2 | P14416 | 4/20 | 0.38 |
| ▸ | ACLY | P53396 | 3/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | ADORA2A | P29274 | 2/20 | 0.37 |
| ▸ | FGB | P02675 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL27733891 | 0.98 | MAPT (0.42) | MAPTMEN1ALDH1A1KMT2AKDM4E | |
| SCHEMBL6759609 | 0.86 | ADORA2A (0.38) | FABP4DRD2ADORA2AADORA1PDE4A | |
| SCHEMBL2498662 | 0.83 | ADORA2A (0.37) | MAPTDRD2NPSR1ADORA2AADORA1 | |
| SCHEMBL10062806 | 0.83 | DRD2 (0.42) | DRD2ADORA2AADORA1PDE4APDE4C | |
| SCHEMBL27796343 | 0.82 | MAPT (0.63) | MAPTMEN1ALDH1A1KMT2AKDM4E | |
| SCHEMBL5904279 | 0.82 | BACE1 (0.46) | MEN1KMT2ADRD2RAB9A | |
| SCHEMBL28568213 | 0.81 | DRD2 (0.46) | MAPTMEN1ALDH1A1KMT2AKDM4E | |
| SCHEMBL5599606 | 0.81 | CA1 (0.50) | ALDH1A1KMT2ADRD2MAPK1POLB | |
| SCHEMBL29414143 | 0.81 | CA1 (0.50) | ALDH1A1KMT2ADRD2MAPK1POLB | |
| SCHEMBL8636736 | 0.80 | IDO1 (0.46) | ALDH1A1FABP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118047908-A | Hydrophobic ion elastomer and preparation method thereof | 福建理工大学 | 2024-05-17 | — | — | CN | claimed |
| CN-1249524-C | Photoresist composition for etch-resistant agent flowing process and method for forming contact hole using the same | HYUNDAI ELECTRONICS IND (KR) | 2006-04-05 | — | — | CN | claimed |
| CN-1217232-C | Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same | HYUNDAI ELECTRONICS IND (JP) | 2005-08-31 | — | — | CN | claimed |
| US-6749990-B2 | UNSATURATED HALOGENATED HYDROCARBON AS PHOTORESIST MONOMER, FOR EXAMPLE 3,3,4,4,5,5,6,6,6-NONAFLUORO-1-HEXENE; ETCHING RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-06-15 | — | — | US | claimed |
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | claimed |
| CN-1285529-A | Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same | HYUNDAI ELECTRONICS IND (JP) | 2001-02-28 | — | — | CN | claimed |
| CN-1255652-A | Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent | HYUNDAI ELECTRONICS IND (KR) | 2000-06-07 | — | — | CN | claimed |
| CN-1255653-A | Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent | HYUNDAI ELECTRONICS IND (KR) | 2000-06-07 | — | — | CN | claimed |
| CN-114131923-B | Method for producing polyurethane three-dimensional objects from materials having multiple hardening mechanisms | 卡本有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-118047908-A | Hydrophobic ion elastomer and preparation method thereof | 福建理工大学 | 2024-05-17 | — | — | CN | disclosed |
| CN-117624491-A | Self-repairing dual-curing photosensitive resin material and preparation method thereof | 福建理工大学 | 2024-03-01 | — | — | CN | disclosed |
| CN-115195104-B | Dual precursor resin system for additive manufacturing with dual cure resins | 卡本有限公司 | 2023-12-05 | — | — | CN | disclosed |
| CN-112867601-B | Method for producing spatially varying dielectric materials, articles produced by the method and use thereof | 罗杰斯公司 | 2023-11-17 | — | — | CN | disclosed |
| CN-108139665-B | Dual precursor resin system for additive manufacturing with dual cure resins | 卡本有限公司 | 2022-07-05 | — | — | CN | disclosed |
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | disclosed |
| US-20020164541-A1 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR, INC. (KR) | 2002-11-07 | — | — | US | disclosed |
| CN-1285529-A | Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same | HYUNDAI ELECTRONICS IND (JP) | 2001-02-28 | — | — | CN | disclosed |
| CN-1264060-A | Photoresist composition with excellent anti-back-exposure delayeed effect | HYUNDAI ELECTRONICS IND (KR) | 2000-08-23 | — | — | CN | disclosed |
| CN-1255653-A | Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent | HYUNDAI ELECTRONICS IND (KR) | 2000-06-07 | — | — | CN | disclosed |
| CN-1255652-A | Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent | HYUNDAI ELECTRONICS IND (KR) | 2000-06-07 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | ETV6, UFM1, UTS2R | MAPT 330/4885MEN1 972/4885ALDH1A1 310/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.