SCHEMBL6759609

SCHEMBL6759609

Cc1ccc(OS(=O)(=O)C(F)(F)F)c(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ADORA2A P29274 1/20 0.38
ADORA1 P30542 1/20 0.38
DRD2 P14416 6/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA9 Q16790 2/20 0.36
CA5A P35218 1/20 0.36
PDE4A P27815 3/20 0.35
PDE4C Q08493 3/20 0.35
PDE4D Q08499 3/20 0.35
DRD3 P35462 3/20 0.35
DRD1 P21728 2/20 0.35
DRD4 P21917 2/20 0.35
DRD5 P21918 2/20 0.35
FABP4 P15090 1/20 0.33
HTR1D P28221 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10029309 0.88 DRD2 (0.41) ADORA2AADORA1DRD2DRD3DRD1
SCHEMBL6764165 0.86 MAPT (0.43) ADORA2AADORA1DRD2PDE4APDE4C
Hydrogen Sulfide SCHEMBL27733891 0.84 MAPT (0.42) ADORA2AADORA1DRD2PDE4APDE4C
SCHEMBL2498662 0.82 ADORA2A (0.37) ADORA2AADORA1DRD2PDE4APDE4C
SCHEMBL10062806 0.82 DRD2 (0.42) ADORA2AADORA1DRD2PDE4APDE4C
SCHEMBL31005122 0.81 CA1 (0.36) ADORA1CA1CA2CA9CA5A
SCHEMBL6938489 0.78 CYP1A2 (0.43) DRD2DRD3DRD1DRD4DRD5
Biphenyl SCHEMBL4350539 0.78 DRD2 (0.39) DRD2CA1CA2CA9DRD3
SCHEMBL2491325 0.77 ATM (0.38) ADORA2AADORA1DRD2PDE4APDE4C
SCHEMBL23581680 0.77 MAPT (0.41) ADORA2AADORA1DRD2PDE4APDE4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6749990-B2 UNSATURATED HALOGENATED HYDROCARBON AS PHOTORESIST MONOMER, FOR EXAMPLE 3,3,4,4,5,5,6,6,6-NONAFLUORO-1-HEXENE; ETCHING RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE HYNIX SEMICONDUCTOR INC. (KR) 2004-06-15 US claimed
US-20030017404-A1 Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2003-01-23 US claimed
CN-112867601-B Method for producing spatially varying dielectric materials, articles produced by the method and use thereof 罗杰斯公司 2023-11-17 CN disclosed
CN-113126432-A Coating composition for photoresist underlayer 罗门哈斯电子材料韩国有限公司 2021-07-16 CN disclosed
CN-105319839-B Gap filling method 罗门哈斯电子材料有限责任公司 2020-11-10 CN disclosed
US-6749990-B2 UNSATURATED HALOGENATED HYDROCARBON AS PHOTORESIST MONOMER, FOR EXAMPLE 3,3,4,4,5,5,6,6,6-NONAFLUORO-1-HEXENE; ETCHING RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE HYNIX SEMICONDUCTOR INC. (KR) 2004-06-15 US disclosed
US-6720129-B2 PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS HYNIX SEMICONDUCTOR INC (KR) 2004-04-13 US disclosed
US-20030017404-A1 Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2003-01-23 US disclosed
US-20020164541-A1 Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same HYNIX SEMICONDUCTOR, INC. (KR) 2002-11-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030017404-A1 Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same ETV6, UFM1, UTS2R ADORA2A 1903/4885ADORA1 280/4885DRD2 2771/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.