SCHEMBL2492417

SCHEMBL2492417

CCN(CC)c1ccc(C(=O)c2ccc(C)cc2)cc1.CCN(CC)c1ccc(C(=O)c2ccc(N(CC)CC)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.61
LMNA P02545 2/20 0.61
SRD5A2 P31213 2/20 0.53
MAPT P10636 6/20 0.51
MEN1 O00255 1/20 0.51
POLB P06746 1/20 0.51
GAA P10253 1/20 0.51
KMT2A Q03164 1/20 0.51
MCL1 Q07820 1/20 0.51
NOX1 Q9Y5S8 1/20 0.51
HTT P42858 3/20 0.51
TSHR P16473 2/20 0.51
MAPK1 P28482 1/20 0.51
HPGD P15428 1/20 0.50
CNR2 P34972 6/20 0.49
CNR1 P21554 3/20 0.48
KDM4E B2RXH2 1/20 0.47
ALDH3A1 P30838 1/20 0.47
ALDH1A3 P47895 1/20 0.47
HDAC3 O15379 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2494123 1.00 ALDH1A1 (0.61) ALDH1A1LMNASRD5A2MAPTMEN1
SCHEMBL29052656 0.93 RAB9A (0.56) ALDH1A1LMNASRD5A2MEN1KMT2A
SCHEMBL61950 0.92 ALDH1A1 (0.58) ALDH1A1LMNAMAPTMEN1POLB
SCHEMBL6567199 0.90 MAPT (0.56) ALDH1A1LMNAMAPTMEN1POLB
Hydrogen Sulfide SCHEMBL6567203 0.90 MAPT (0.56) ALDH1A1LMNAMAPTMEN1POLB
SCHEMBL6569210 0.90 MAPT (0.56) ALDH1A1LMNAMAPTMEN1POLB
Bicarbonate SCHEMBL11138673 0.86 CNR2 (0.56) ALDH1A1LMNAMAPTMEN1KMT2A
Benzophenone SCHEMBL10489584 0.85 HPGD (0.63) ALDH1A1SRD5A2MAPTMEN1POLB
SCHEMBL9179627 0.85 ALDH1A1 (0.73) ALDH1A1MAPTMEN1POLBGAA
Michler'S Ketone SCHEMBL15511297 0.85 ALDH1A1 (0.73) ALDH1A1MAPTMEN1POLBGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed