⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11391663 | 0.71 | — | — | |
| SCHEMBL332928 | 0.71 | — | — | |
| SCHEMBL5408346 | 0.68 | — | — | |
| SCHEMBL11431878 | 0.68 | — | — | |
| SCHEMBL6834913 | 0.67 | — | — | |
| SCHEMBL653461 | 0.65 | SLC6A3 (0.36) | — | |
| SCHEMBL5398625 | 0.65 | SPHK1 (0.30) | — | |
| SCHEMBL150988 | 0.64 | TSHR (0.32) | — | |
| SCHEMBL3847162 | 0.64 | — | — | |
| SCHEMBL21086749 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2486453-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2014-01-29 | — | — | EP | claimed |
| US-7794915-B2 | Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method | MITSUI CHEMICALS, INC. (JP) | 2010-09-14 | — | — | US | claimed |
| US-20080085470-A1 | Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method | MITSUI CHEMICALS, INC. (JP) | 2008-04-10 | — | — | US | claimed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| EP-1738225-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | MERCK PATENT GMBH (DE) | 2018-11-14 | — | — | EP | disclosed |
| EP-2718379-B1 | BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF | MERCK PATENT GMBH (DE) | 2016-08-17 | — | — | EP | disclosed |
| EP-1276012-B1 | Resist patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| EP-2718379-A1 | BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF | AZ Electronic Materials USA Corp. (US) | 2014-04-16 | — | — | EP | disclosed |
| EP-2486453-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2014-01-29 | — | — | EP | disclosed |
| US-8632948-B2 | Positive-working photoimageable bottom antireflective coating | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-01-21 | — | — | US | disclosed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| US-6284429-B1 | FOR FORMULATING PHOTORESISTS HAVING SENSITIVITY, RESOLUTION, ETCHING RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-04 | — | — | US | disclosed |
| US-6284429-B1 | FOR FORMULATING PHOTORESISTS HAVING SENSITIVITY, RESOLUTION, ETCHING RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-04 | — | — | US | disclosed |
| EP-1004568-A3 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-28 | — | — | EP | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |