SCHEMBL2494110

SCHEMBL2494110

Clc1cc(Cl)c(C2(C3(c4c(Cl)cc(Cl)cc4Cl)N=C(c4ccccc4)C(c4ccccc4)=N3)N=C(c3ccccc3)C(c3ccccc3)=N2)c(Cl)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.37
PTGS2 P35354 1/20 0.37
ALDH1A1 P00352 5/20 0.36
NPSR1 Q6W5P4 3/20 0.36
LMNA P02545 2/20 0.36
SMN1; SMN2 Q16637 4/20 0.36
NPC1 O15118 2/20 0.36
TP53 P04637 2/20 0.36
TSHR P16473 2/20 0.36
RAB9A P51151 2/20 0.36
NFKB1 P19838 1/20 0.36
NFKB2 Q00653 1/20 0.36
RELA Q04206 1/20 0.36
HPGD P15428 3/20 0.36
HSD17B10 Q99714 1/20 0.36
CYP1A2 P05177 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
HSD11B1 P28845 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL491126 0.86 CYP2A6 (0.41) ALDH1A1LMNASMN1; SMN2NPC1TP53
SCHEMBL8666379 0.81 CYP2A6 (0.34) ALDH1A1LMNASMN1; SMN2NPC1TP53
SCHEMBL80380 0.79 CHRM1 (0.41) PTGS2ALDH1A1NPSR1LMNASMN1; SMN2
SCHEMBL8664748 0.73 CYP1A2 (0.48) ALDH1A1NPSR1LMNASMN1; SMN2NPC1
SCHEMBL82274 0.73 TAAR1 (0.40) ALDH1A1LMNASMN1; SMN2NPC1TP53
SCHEMBL8666424 0.73 RHEB (0.44) ALDH1A1SMN1; SMN2NPC1RAB9AMEN1
SCHEMBL356036 0.73 CYP2A6 (0.36) ALDH1A1LMNASMN1; SMN2NPC1TSHR
SCHEMBL29403344 0.73 CYP2A6 (0.36) ALDH1A1LMNASMN1; SMN2NPC1TSHR
SCHEMBL8668404 0.73 CYP2A6 (0.43) ALDH1A1LMNASMN1; SMN2NPC1TP53
SCHEMBL2498529 0.72 PTPN1 (0.37) PTGS1ALDH1A1NPSR1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1048700-B1 Ink jet color filter resin composition, color filter production process SEIKO EPSON CORP (JP) 2006-11-02 EP claimed
US-6627364-B2 Contains (A) a colorant, (B) a binder resin and (C) a solvent having a boiling point of 245 degrees C. or more at normal pressure. SEIKO EPSON CORPORATION (JP) 2003-09-30 US claimed
US-20020128351-A1 Ink jet color filter resin composition, color filter and color filter production process SEIKO EPSON CORPORATION (JP) 2002-09-12 US claimed
EP-1048700-A1 Ink jet color filter resin composition, color filter production process SEIKO EPSON CORPORATION (JP) 2000-11-02 EP claimed
US-5866298-A Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-02-02 US claimed
EP-0775941-A1 Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-05-28 EP claimed
US-9068082-B2 Colored curable composition and color filter FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20150108086-A1 COLORED CURABLE COMPOSITION AND COLOR FILTER FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20020128351-A1 Ink jet color filter resin composition, color filter and color filter production process SEIKO EPSON CORPORATION (JP) 2002-09-12 US disclosed
EP-1048700-A1 Ink jet color filter resin composition, color filter production process SEIKO EPSON CORPORATION (JP) 2000-11-02 EP disclosed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US disclosed
US-5866298-A Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-02-02 US disclosed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
EP-0775941-A1 Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-05-28 EP disclosed