Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.34 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | RAB9A | P51151 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | ALPL | P05186 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2494110 | 0.86 | PTGS1 (0.37) | CYP2A6LMNATSHRALDH1A1CYP1A2 | |
| SCHEMBL82274 | 0.82 | TAAR1 (0.40) | CYP2A6LMNATSHRALDH1A1CYP1A2 | |
| SCHEMBL29403344 | 0.81 | CYP2A6 (0.36) | CYP2A6LMNATSHRALDH1A1CYP1A2 | |
| SCHEMBL356036 | 0.81 | CYP2A6 (0.36) | CYP2A6LMNATSHRALDH1A1CYP1A2 | |
| SCHEMBL8668404 | 0.81 | CYP2A6 (0.43) | CYP2A6LMNATSHRALDH1A1CYP1A2 | |
| SCHEMBL8666379 | 0.78 | CYP2A6 (0.34) | CYP2A6LMNATSHRALDH1A1CYP1A2 | |
| SCHEMBL3394827 | 0.75 | ALDH1A1 (0.35) | TSHRALDH1A1CYP1A2MEN1KMT2A | |
| SCHEMBL8664748 | 0.73 | CYP1A2 (0.48) | LMNATSHRALDH1A1CYP1A2RAB9A | |
| SCHEMBL491053 | 0.73 | ALDH1A1 (0.39) | LMNATSHRALDH1A1MEN1KMT2A | |
| SCHEMBL2498529 | 0.72 | PTPN1 (0.37) | LMNATSHRALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9341743-B2 | Photosensitive resin composition for color filter, and color filter prepared using the same | CHEIL INDUSTRIES INC. (KR) | 2016-05-17 | — | — | US | disclosed |
| US-9297940-B2 | Photosensitive resin composition and color filter prepared using the same | CHEIL INDUSTRIES INC. (KR) | 2016-03-29 | — | — | US | disclosed |
| US-9146465-B2 | Photosensitive resin composition and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2015-09-29 | — | — | US | disclosed |
| US-20150053900-A1 | Photosensitive Resin Composition for Color Filter, and Color Filter Prepared Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-02-26 | — | — | US | disclosed |
| US-20150034886-A1 | Photosensitive Resin Composition and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-02-05 | — | — | US | disclosed |
| US-20150028271-A1 | Photosensitive Resin Composition and Color Filter Prepared Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-01-29 | — | — | US | disclosed |
| US-8920689-B2 | Photosensitive resin composition for color filter and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2014-12-30 | — | — | US | disclosed |
| US-8911647-B2 | Photosensitive resin composition for color filter and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2014-12-16 | — | — | US | disclosed |
| US-8906271-B2 | Photosensitive resin composition for color filter and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2014-12-09 | — | — | US | disclosed |
| US-20140175346-A1 | Photosensitive Resin Composition for Color Filter and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2014-06-26 | — | — | US | disclosed |
| WO-2006053689-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-05-26 | — | — | WO | disclosed |
| WO-2006044243-A2 | HOLOGRAPHIC STORAGE MEDIUM | GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060078802-A1 | Holographic storage medium | SABIC INNOVATIVE PLASTICS IP B.V. | 2006-04-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2005054952-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2005-06-16 | — | — | WO | disclosed |
| US-6844136-B1 | Photopolymerizable mixture and recording material prepared therewith | AGFA-GEVAERT (BE) | 2005-01-18 | — | — | US | disclosed |
| WO-2004111731-A1 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-12-23 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| EP-1079276-A1 | Photopolymerisable mixture and recording material prepared therewith | AGFA-GEVAERT naamloze vennootschap (BE) | 2001-02-28 | — | — | EP | disclosed |