Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.37 |
| ▸ | BACE1 | P56817 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | MAOA | P21397 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | USP7 | Q93009 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | GP6 | Q9HCN6 | 1/20 | 0.33 |
| ▸ | IKBKB | O14920 | 1/20 | 0.33 |
| ▸ | CHUK | O15111 | 1/20 | 0.33 |
| ▸ | IKBKE | Q14164 | 1/20 | 0.33 |
| ▸ | PKMYT1 | Q99640 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.33 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | SMARCA2 | P51531 | 1/20 | 0.32 |
| ▸ | SMARCA4 | P51532 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2496323 | 0.78 | MEN1 (0.38) | BACE1ALDH1A1MAOAKMT2ASMN1; SMN2 | |
| SCHEMBL2534150 | 0.73 | NPC1 (0.41) | ALDH1A1KMT2ASMN1; SMN2TSHRCHRM1 | |
| SCHEMBL3394827 | 0.72 | ALDH1A1 (0.35) | BACE1ALDH1A1KMT2ASMN1; SMN2TSHR | |
| SCHEMBL8665932 | 0.72 | IDO1 (0.37) | BACE1ALDH1A1KMT2ASMN1; SMN2TSHR | |
| SCHEMBL2494110 | 0.72 | PTGS1 (0.37) | ALDH1A1KMT2ASMN1; SMN2TSHRCHRM1 | |
| SCHEMBL2494354 | 0.72 | PSMB5 (0.40) | BACE1ALDH1A1KMT2ASMN1; SMN2TSHR | |
| SCHEMBL8666970 | 0.72 | ADORA2A (0.33) | BACE1ALDH1A1MAOAKMT2ASMN1; SMN2 | |
| SCHEMBL490734 | 0.71 | ALDH1A1 (0.41) | ALDH1A1TSHRATM | |
| SCHEMBL491053 | 0.70 | ALDH1A1 (0.39) | BACE1ALDH1A1KMT2ASMN1; SMN2TSHR | |
| SCHEMBL10029667 | 0.67 | LMNA (0.50) | PTPN1BACE1ALDH1A1MAOAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10113907-B2 | Ultraviolet-sensing sheet, ultraviolet-sensing set, and ultraviolet-sensing method | FUJIFILM CORPORATION (JP) | 2018-10-30 | — | — | US | disclosed |
| US-20170131144-A1 | ULTRAVIOLET-SENSING SHEET, ULTRAVIOLET-SENSING SET, AND ULTRAVIOLET-SENSING METHOD | FUJIFILM CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9068082-B2 | Colored curable composition and color filter | FUJIFILM CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20150108086-A1 | COLORED CURABLE COMPOSITION AND COLOR FILTER | FUJIFILM CORPORATION (JP) | 2015-04-23 | — | — | US | disclosed |
| US-8029877-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100238388-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7758930-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20090202749-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | HAYASHI SHINJI | 2009-08-13 | — | — | US | disclosed |
| US-7537810-B2 | Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20060229376-A1 | Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |
| US-5866298-A | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-02-02 | — | — | US | disclosed |
| US-5792589-A | ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-08-11 | — | — | US | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |