SCHEMBL24944136

SCHEMBL24944136

CCCCC/C=C/C/C=C\CCCCCCCCC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 3/20 0.47
FAAH O00519 2/20 0.47
CNR1 P21554 1/20 0.47
CNR2 P34972 1/20 0.47
ALDH1A1 P00352 4/20 0.46
F7 P08709 4/20 0.46
F3 P13726 4/20 0.46
PPARG P37231 3/20 0.46
PPARD Q03181 3/20 0.46
PPARA Q07869 3/20 0.46
FABP3 P05413 3/20 0.46
FFAR1 O14842 3/20 0.46
KDM4E B2RXH2 3/20 0.46
PTGS1 P23219 2/20 0.46
DUSP3 P51452 1/20 0.46
PTPN7 P35236 1/20 0.46
LMNA P02545 1/20 0.46
CYP3A4 P08684 1/20 0.46
CYP19A1 P11511 1/20 0.46
FABP4 P15090 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944231 0.98 SOAT2 (0.46) EPHX2FAAHCNR1CNR2ALDH1A1
SCHEMBL24944341 0.98 SOAT2 (0.46) EPHX2FAAHCNR1CNR2ALDH1A1
SCHEMBL24944003 0.91 OPRM1 (0.47)
SCHEMBL24944630 0.91 OPRM1 (0.47)
SCHEMBL24944835 0.91 OPRM1 (0.47)
SCHEMBL24944841 0.91 OPRM1 (0.47)
SCHEMBL24944838 0.91 OPRM1 (0.47)
SCHEMBL24944002 0.91 OPRM1 (0.47)
SCHEMBL24944839 0.91 OPRM1 (0.47)
SCHEMBL24944001 0.91 OPRM1 (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR EPHX2 3943/4885FAAH 3439/4885CNR1 269/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.