SCHEMBL24944341

SCHEMBL24944341

CCCCCCCC/C=C/CCCCCCCC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SOAT2 O75908 1/20 0.46
SOAT1 P35610 1/20 0.46
FAAH O00519 3/20 0.45
EPHX2 P34913 2/20 0.45
POLM Q9NP87 1/20 0.43
POLK Q9UBT6 1/20 0.43
POLL Q9UGP5 1/20 0.43
POLH Q9Y253 1/20 0.43
CNR1 P21554 1/20 0.43
CNR2 P34972 1/20 0.43
ALDH1A1 P00352 4/20 0.42
F7 P08709 4/20 0.42
F3 P13726 4/20 0.42
PPARG P37231 4/20 0.42
PPARD Q03181 4/20 0.42
PPARA Q07869 4/20 0.42
FABP4 P15090 3/20 0.42
HSD17B10 Q99714 3/20 0.42
DUSP3 P51452 2/20 0.42
PTPN7 P35236 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944231 1.00 SOAT2 (0.46) SOAT2SOAT1FAAHEPHX2POLM
SCHEMBL24944136 0.98 EPHX2 (0.47) SOAT2SOAT1FAAHEPHX2CNR1
SCHEMBL24944630 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944836 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944001 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944838 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944614 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944000 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944002 0.93 OPRM1 (0.47) OPRM1MMP2
SCHEMBL24944837 0.93 OPRM1 (0.47) OPRM1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SOAT2 3832/4885SOAT1 3431/4885FAAH 3439/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.