SCHEMBL24944241

SCHEMBL24944241

O=C(/C=C/c1ccc(Cl)cc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.46
LMNA P02545 2/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.43
MAPT P10636 2/20 0.43
CYP1B1 Q16678 1/20 0.43
DRD2 P14416 1/20 0.42
CYP1A2 P05177 1/20 0.42
ATM Q13315 1/20 0.41
MAOA P21397 1/20 0.40
EGFR P00533 1/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
NPY1R P25929 1/20 0.40
NPY2R P49146 1/20 0.40
USP2 O75604 1/20 0.39
NOS2 P35228 1/20 0.39
NLRP3 Q96P20 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944237 0.91 LMNA (0.43) MAOBLMNAKMT2AMAPTCYP1B1
SCHEMBL24943654 0.88 MAPT (0.46) LMNAKMT2AL3MBTL1MAPTCYP1B1
SCHEMBL26478925 0.88 MAPT (0.43) MAOBLMNAKMT2AMAPTCYP1B1
SCHEMBL26413649 0.88 CYP1B1 (0.43) MAOBLMNAMEN1KMT2AL3MBTL1
SCHEMBL24944271 0.87 MAOB (0.49) MAOBLMNAMEN1KMT2AMAPT
SCHEMBL24943658 0.85 BCHE (0.50) MAOBMEN1KMT2AMAPTCYP1B1
SCHEMBL24943723 0.85 MAPT (0.37) MAOBLMNAKMT2AL3MBTL1MAPT
SCHEMBL24944655 0.84 POLB (0.39) LMNAMEN1KMT2AMAPTDRD2
SCHEMBL24944275 0.84 MAOB (0.45) MAOBLMNAMEN1KMT2AL3MBTL1
SCHEMBL24944072 0.84 HDAC3 (0.42) MAOBLMNAKMT2AMAPTCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MAOB 4669/4885LMNA 2930/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.