SCHEMBL24944237

SCHEMBL24944237

O=C(/C=C/c1ccccc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.43
OPRM1 P35372 3/20 0.43
OPRL1 P41146 1/20 0.43
KMT2A Q03164 2/20 0.42
MAPT P10636 5/20 0.42
ALDH1A1 P00352 2/20 0.42
HDAC3 O15379 2/20 0.42
HDAC4 P56524 2/20 0.42
HDAC1 Q13547 2/20 0.42
HDAC2 Q92769 2/20 0.42
HDAC8 Q9BY41 2/20 0.42
HDAC6 Q9UBN7 2/20 0.42
PLIN1 O60240 2/20 0.42
RECQL P46063 2/20 0.42
PLIN5 Q00G26 2/20 0.42
ABHD5 Q8WTS1 2/20 0.42
TNKS O95271 1/20 0.42
HCAR2 Q8TDS4 1/20 0.42
HDAC7 Q8WUI4 1/20 0.42
HDAC10 Q969S8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944072 0.92 HDAC3 (0.42) LMNAOPRM1OPRL1KMT2AMAPT
SCHEMBL26478925 0.91 MAPT (0.43) LMNAOPRM1KMT2AMAPTALDH1A1
SCHEMBL26413649 0.91 CYP1B1 (0.43) LMNAOPRM1OPRL1KMT2AMAPT
SCHEMBL24943654 0.91 MAPT (0.46) LMNAOPRM1OPRL1KMT2AMAPT
SCHEMBL24944241 0.91 MAOB (0.46) LMNAKMT2AMAPTCYP1A2MAOB
SCHEMBL24944274 0.90 AKR1B10 (0.48) AKR1B10AKR1B1MAOB
SCHEMBL24943658 0.89 BCHE (0.50) KMT2AMAPTALDH1A1HDAC3HDAC1
SCHEMBL24943656 0.88 MAOA (0.41) LMNAOPRM1OPRL1MAPTALDH1A1
SCHEMBL24944271 0.88 MAOB (0.49) LMNAKMT2AMAPTALDH1A1CYP1A2
SCHEMBL26478935 0.88 HSD17B3 (0.48) KMT2AMAPTALDH1A1CYP2D6MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR LMNA 2930/4885OPRM1 775/4885OPRL1 1474/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.