SCHEMBL24944271

SCHEMBL24944271

O=C(/C=C/c1cccc(Cl)c1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 5/20 0.49
CYP1A2 P05177 3/20 0.48
CYP2C9 P11712 1/20 0.48
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
SMN1; SMN2 Q16637 4/20 0.44
MAPT P10636 2/20 0.43
MAOA P21397 3/20 0.43
CYP1A1 P04798 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP1B1 Q16678 1/20 0.43
ALDH1A1 P00352 4/20 0.42
HPGD P15428 2/20 0.42
EGFR P00533 1/20 0.41
MMP1 P03956 1/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
PKM P14618 1/20 0.41
NPY1R P25929 1/20 0.41
NTSR1 P30989 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944274 0.88 AKR1B10 (0.48) MAOBMAOAMMP1MMP2MMP9
SCHEMBL24944237 0.88 LMNA (0.43) MAOBCYP1A2CYP2C9KMT2ASMN1; SMN2
SCHEMBL24944241 0.87 MAOB (0.46) MAOBCYP1A2MEN1KMT2AMAPT
SCHEMBL26478935 0.86 HSD17B3 (0.48) MAOBMEN1KMT2AMAPTMAOA
SCHEMBL24943656 0.86 MAOA (0.41) MAOBMAPTMAOAALDH1A1EGFR
SCHEMBL24944264 0.84 BCHE (0.53) MAOBCYP1A2CYP2C9MEN1KMT2A
SCHEMBL24943723 0.84 MAPT (0.37) MAOBKMT2AMAPTEGFRLMNA
SCHEMBL24944655 0.83 POLB (0.39) MEN1KMT2ASMN1; SMN2MAPTALDH1A1
SCHEMBL26413717 0.82 MAPT (0.53) MAOBMEN1KMT2AMAPTALDH1A1
SCHEMBL24944275 0.81 MAOB (0.45) MAOBCYP1A2MEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MAOB 4669/4885CYP1A2 4868/4885CYP2C9 4777/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.